Influence of AlN interlayer on the anisotropic electron mobility and the device characteristics of N-polar AlGaN/GaN metal-insulator-semiconductor-high electron mobility transistors grown on vicinal substrates

2010 ◽  
Vol 108 (7) ◽  
pp. 074502 ◽  
Author(s):  
Seshadri Kolluri ◽  
Stacia Keller ◽  
David Brown ◽  
Geetak Gupta ◽  
Siddharth Rajan ◽  
...  
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