Carbon dangling-bond center (carbon Pb center) at 4H-SiC(0001)/SiO2 interface

The defects at the 3C-SiC/SiO2 interface have been studied by X-band EPR spectroscopy in oxidized porous 3C-SiC. One interface defect is detected; its spin Hamiltonian parameters, spin S=1/2, C3V symmetry, g//=2.00238 and g⊥=2.00317, central hyperfine interaction (CHF) with one carbon atom and AB//[001]=48G and superhyperfine (SHF) interaction with three equivalent Si neighbour atoms and TB//[001]=12.4G, allow us to attribute the center to a sp3 coordinated carbon dangling bond center, PbC.

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Forming Gas Annealing of the Carbon PbC Center in Oxidized Porous 3C- and 4H-SiC: An EPR Study

Materials Science Forum ◽

10.4028/www.scientific.net/msf.527-529.1015 ◽

2006 ◽

Vol 527-529 ◽

pp. 1015-1018 ◽

Cited By ~ 4

Author(s):

J.L. Cantin ◽

Hans Jürgen von Bardeleben

Keyword(s):

Electron Paramagnetic Resonance ◽

Dissociation Energy ◽

Vacuum Annealing ◽

Dangling Bond ◽

Dangling Bonds ◽

Paramagnetic Resonance ◽

Interface Defect ◽

Bond Center ◽

Electron Paramagnetic

Previous Electron Paramagnetic Resonance (EPR) studies identified the carbon dangling bond center as the main paramagnetic interface defect in 3C, 4H, 6H-SiC/SiO2. We demonstrate that this defect, called PbC center, can be passivated by forming gas annealing at 400°C. We have measured the PbC density at annealed 4H- and 3C-SiC/SiO2 interfaces and attributed its reduction to the transformation of the dangling bonds into EPR inactive C-H bonds. We have also studied the reverse phenomenon occurring during vacuum annealing at temperatures ranging from 600°C up to 1000°C and have determined a dissociation energy of ≈4.3 eV for the 3C and 4H polytypes.

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Energy level of neutral dangling-bond center (DO) in undoped a:Si:H determined by isothermal capacitance transient spectroscopy under high temperature

Journal of Non-Crystalline Solids ◽

10.1016/0022-3093(87)90170-0 ◽

1987 ◽

Vol 97-98 ◽

pp. 723-726 ◽

Cited By ~ 3

Author(s):

Kouji Mori ◽

Hideyo Okushi ◽

Kazunobu Tanaka

Keyword(s):

High Temperature ◽

Energy Level ◽

Dangling Bond ◽

Bond Center ◽

Transient Spectroscopy ◽

Capacitance Transient ◽

Isothermal Capacitance Transient Spectroscopy

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Identification of the Carbon Dangling Bond Center at the4H−SiC/SiO2Interface by an EPR Study in Oxidized Porous SiC

Physical Review Letters ◽

10.1103/physrevlett.92.015502 ◽

2004 ◽

Vol 92 (1) ◽

Cited By ~ 79

Author(s):

J. L. Cantin ◽

H. J. von Bardeleben ◽

Y. Shishkin ◽

Y. Ke ◽

R. P. Devaty ◽

...

Keyword(s):

Dangling Bond ◽

Bond Center ◽

Porous Sic

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Paramagnetic Nitrogen Defects in Silicon Nitride

MRS Proceedings ◽

10.1557/proc-284-101 ◽

1992 ◽

Vol 284 ◽

Cited By ~ 3

Author(s):

W. L. Warren ◽

J. Kanicki ◽

J. Robertson ◽

E. H. Poindexte

Keyword(s):

Silicon Nitride ◽

Energy Level ◽

Theoretical Calculations ◽

Dangling Bond ◽

Compositional Dependence ◽

Hydrogenated Silicon ◽

Amorphous Hydrogenated Silicon ◽

Bond Center ◽

Simple Exponential Function ◽

Post Deposition

ABSTRACTThe photocreation mechanisms and properties of nitrogen dangling bonds in amorphous hydrogenated silicon nitride (a-SiNx:H) thin films are investigated. We find that the creation kinetics are strongly dependent on the post-deposition anneal; this thermal process can be described by a simple exponential function which yields an activation energy of 0.8 eV. The compositional dependence of the nitrogen dangling bond center suggests that its energy level lies close to the valence band edge, in agreement with theoretical calculations. This energy level position can explain why a-SiNx:H films often become conducting following a high post-deposition anneal.

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Temperature Dependent Line-Shape of the Silicon Dangling Bond EPR-Resonance in Polycrystalline Silicon

MRS Proceedings ◽

10.1557/proc-452-1019 ◽

1996 ◽

Vol 452 ◽

Cited By ~ 1

Author(s):

N. H. Nickel ◽

E. A. Schiff

Keyword(s):

Electron Paramagnetic Resonance ◽

Polycrystalline Silicon ◽

Room Temperature ◽

Dangling Bond ◽

Temperature Dependent ◽

Paramagnetic Resonance ◽

Temperature Electron ◽

Motional Narrowing ◽

G Value ◽

Electron Paramagnetic

AbstractThe temperature dependence of the silicon dangling-bond resonance in polycrystalline (poly-Si) and amorphous silicon (a-Si:H) was measured. At room temperature, electron paramagnetic resonance (EPR) measurements reveal an isotropie g-value of 2.0055 and a line width of 6.5 and 6.1 G for Si dangling-bonds in a-Si:H and poly-Si, respectively. In both materials spin density and g-value are independent of temperature. While in a-Si:H the width of the resonance did not change with temperature, poly-Si exhibits a remarkable T dependence of ΔHpp. In unpassivated poly-Si a pronounced decrease of ΔHpp is observed for temperatures above 300 K. At 384 K ΔHpp reaches a minimum of 5.1 G, then increases to 6.1 G at 460 K, and eventually decreases to 4.6 G at 530 K. In hydrogenated poly-Si ΔHpp decreases monotonically above 425 K. The decrease of ΔHpp is attributed to electron hopping causing motional narrowing. An average hopping distance of 15 and 17.5 Å was estimated for unhydrogenated and H passivated poly-Si, respectively.

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Radiation Effect on the Electron Transport Properties of SiO2/Si Interface: Role of Si Dangling-Bond Defects and Oxygen Vacancy

2018 IEEE 2nd International Conference on Dielectrics (ICD) ◽

10.1109/icd.2018.8514656 ◽

2018 ◽

Author(s):

Guanghao Qu ◽

Daomin Min ◽

Zhonghua Zhao ◽

Michel Frechette ◽

Shengtao Li

Keyword(s):

Electron Transport ◽

Oxygen Vacancy ◽

Transport Properties ◽

Radiation Effect ◽

Dangling Bond ◽

Electron Transport Properties

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Bond equilibrium theory for Te-rich liquid Tl–Te alloys

Canadian Journal of Chemistry ◽

10.1139/v77-269 ◽

1977 ◽

Vol 55 (11) ◽

pp. 1930-1936 ◽

Cited By ~ 2

Author(s):

Melvin Cutler

Keyword(s):

Free Energy ◽

Good Description ◽

Hole Concentration ◽

Enthalpy Of Mixing ◽

Dangling Bond ◽

Fermi Model ◽

Bond Model ◽

Independent Information ◽

Molecular Bond ◽

Rich Liquid

Recent work has provided independent information about the behavior of the hole concentration c in TlxTe1−x as a function of temperature T and composition x in the range 0.2 ≤ x ≤ 0.6. This makes possible a critical reexamination of a molecular bond model for the structure of the alloy, in which holes are generated by broken Te—Te bonds. The earlier theory is revised to formulate an unrestricted independent bond model (ibm), for which the equations are simple and have obvious physical interpretations. This provides a good description of c(T) but only a qualitatively correct c(x). Using a Thomas–Fermi model for the screening interaction between holes and the acceptor ions, it is shown that the equilibrium constant can be expected to increase rapidly with c at large enough values. A modification in which the free energy of a dangling bond is decreased by proximity to a Tl—Te bond is found to significantly improve the result for c(x). The thermochemical behavior is derived. The entropy of mixing is in fair agreement with experiment, but the enthalpy of mixing is grossly wrong. This reflects the neglect of intermolecular interactions in the theory, which, it seems, can easily account for the remaining discrepancies in the predicted behavior of c.

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