Hollow cathode plasma assisted chemical vapor deposition of diamond

1988 ◽  
Vol 52 (20) ◽  
pp. 1658-1660 ◽  
Author(s):  
B. Singh ◽  
O. R. Mesker ◽  
A. W. Levine ◽  
Y. Arie
Keyword(s):  
Chemical Vapor Deposition ◽  
Hollow Cathode ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Cathode Plasma

Characterization of TiO film prepared by plasma enhanced chemical vapor deposition using a multi-jet hollow cathode plasma source

2001 ◽  
Vol 175-176 ◽  
pp. 697-702 ◽  
Author(s):  
Masatoshi Nakamura ◽  
Dariusz Korzec ◽  
Toru Aoki ◽  
Jurgen Engemann ◽  
Yoshinori Hatanaka
Keyword(s):  
Chemical Vapor Deposition ◽  
Hollow Cathode ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Plasma Source ◽  
Cathode Plasma

Variable corrosion behavior of a thick amorphous carbon coating in NaCl solution

RSC Advances ◽  
2015 ◽  
Vol 5 (116) ◽  
pp. 95750-95763 ◽  
Author(s):  
Renhui Zhang ◽  
Liping Wang ◽  
Wei Shi
Keyword(s):  
Chemical Vapor Deposition ◽  
Amorphous Carbon ◽  
Hollow Cathode ◽  
Vapor Deposition ◽  
Carbon Coating ◽  
Chemical Vapor ◽  
Nacl Solution ◽  
Deposition Technique ◽  
Cathode Plasma ◽  
Vapor Deposition Technique

The present work investigates a thick amorphous multi-layer carbon coating fabricated by a plane hollow cathode plasma-enhanced chemical vapor deposition technique.

Diamond Growth by Dual Hollow Cathode Arc Chemical Vapor Deposition

1997 ◽  
Vol 36 (Part 2, No. 10B) ◽  
pp. L1406-L1409 ◽  
Author(s):  
Gou-Tsau Liang ◽  
Franklin Chau-Nan Hong
Keyword(s):  
Chemical Vapor Deposition ◽  
Hollow Cathode ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Diamond Growth ◽  
Cathode Arc

Intermittent growth of a diamond film by direct current hot cathode plasma chemical vapor deposition

Carbon ◽  
2013 ◽  
Vol 51 ◽  
pp. 437 ◽  
Author(s):  
Hong-wei Jiang ◽  
Hai-liang Huang ◽  
Xiang-hua Jia ◽  
Long-cheng Yin ◽  
Yu-qiang Chen ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Direct Current ◽  
Diamond Film ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Cathode Plasma ◽  
Plasma Chemical Vapor Deposition

Diamond growth by hollow cathode arc plasma chemical vapor deposition

1998 ◽  
Vol 13 (11) ◽  
pp. 3114-3121 ◽  
Author(s):  
Gou-Tsau Liang ◽  
Franklin Chau-Nan Hong
Keyword(s):  
Chemical Vapor Deposition ◽  
Substrate Temperature ◽  
Hollow Cathode ◽  
Vapor Deposition ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Arc Plasma ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Cathode Arc

Hollow cathode arc plasma chemical vapor deposition was employed to grow crystalline diamond films using 1.5% to 7% of methane in hydrogen. The growth rate was as high as 3.2 μ/h when using 5% CH4/H2 at a pressure of 15 Torr and a substrate temperature of 1083 K. However, an intermediate layer of several hundred nanometers was observed at the film-substrate interface by cross-section SEM. Raman and XPS characterizations showed that the interfacial layer consisted of sp2 carbon and TaC with Ta vaporized from the hot cathode tube. XRD and XPS results further showed that the deposited diamond films also contained TaC. Ta composition in the film increased with the increase of growth pressure, the reduction of substrate temperature, and the increase of H2 flow in the Ta tube. The diamond films deposited by using CHCl3 as carbon source had Ta concentrations one order of magnitude higher than those using CH4, as shown by XPS results, but the nucleation densities using CHCl3 were always higher than those using CH4.

scholarly journals Hollow-cathode chemical vapor deposition of thick, low-stress diamond-like carbon films

2020 ◽  
Vol 714 ◽  
pp. 138394
Author(s):  
J. Miller ◽  
A. Ceballos ◽  
L.B. Bayu Aji ◽  
A. Moore ◽  
C. Wasz ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Hollow Cathode ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Diamond Like Carbon
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