Characterization of TiO film prepared by plasma enhanced chemical vapor deposition using a multi-jet hollow cathode plasma source

2001 ◽  
Vol 175-176 ◽  
pp. 697-702 ◽  
Author(s):  
Masatoshi Nakamura ◽  
Dariusz Korzec ◽  
Toru Aoki ◽  
Jurgen Engemann ◽  
Yoshinori Hatanaka
RSC Advances ◽  
2015 ◽  
Vol 5 (116) ◽  
pp. 95750-95763 ◽  
Author(s):  
Renhui Zhang ◽  
Liping Wang ◽  
Wei Shi

The present work investigates a thick amorphous multi-layer carbon coating fabricated by a plane hollow cathode plasma-enhanced chemical vapor deposition technique.


1988 ◽  
Vol 52 (20) ◽  
pp. 1658-1660 ◽  
Author(s):  
B. Singh ◽  
O. R. Mesker ◽  
A. W. Levine ◽  
Y. Arie

2015 ◽  
Vol 32 (6) ◽  
pp. 638
Author(s):  
Xingmin Cai ◽  
Xiaoqiang Su ◽  
Fan Ye ◽  
Huan Wang ◽  
Guangxing Liang ◽  
...  

2020 ◽  
Vol 13 (7) ◽  
pp. 075505
Author(s):  
Tomohiro Yamaguchi ◽  
Hiroki Nagai ◽  
Takanori Kiguchi ◽  
Nao Wakabayashi ◽  
Takuto Igawa ◽  
...  

Author(s):  
A. Ramos-Carrazco ◽  
J. A. Gallardo-Cubedo ◽  
A. Vera-Marquina ◽  
A. L. Leal-Cruz ◽  
J. R. Noriega ◽  
...  

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