Characterization of TiO film prepared by plasma enhanced chemical vapor deposition using a multi-jet hollow cathode plasma source
2001 ◽
Vol 175-176
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pp. 697-702
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Keyword(s):
Keyword(s):
1999 ◽
Vol 38
(Part 1, No. 11)
◽
pp. 6438-6444
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Keyword(s):