Flow Z-pinch plasma production on the FuZE experiment

2020 ◽  
Vol 27 (11) ◽  
pp. 112503
Author(s):  
A. D. Stepanov ◽  
U. Shumlak ◽  
H. S. McLean ◽  
B. A. Nelson ◽  
E. L. Claveau ◽  
...  
Keyword(s):  
Plasma Production ◽  
Pinch Plasma ◽  
Z Pinch

Formation of a sheared flow z-pinch plasma

2001 ◽  
Author(s):  
R. Golingo ◽  
U. Shumlak ◽  
B. Nelson
Keyword(s):  
Pinch Plasma ◽  
Sheared Flow ◽  
Z Pinch

Preliminary investigation on the use of low current pulsed power Z-pinch plasma devices for the study of early stage plasma instabilities

2017 ◽  
Vol 60 (1) ◽  
pp. 014031 ◽  
Author(s):  
E Kaselouris ◽  
V Dimitriou ◽  
I Fitilis ◽  
A Skoulakis ◽  
G Koundourakis ◽  
...  
Keyword(s):  
Early Stage ◽  
Preliminary Investigation ◽  
Pulsed Power ◽  
Plasma Instabilities ◽  
Pinch Plasma ◽  
Z Pinch

scholarly journals Evidence for recombination XUV lasing at 52.0 nm and 49.8 nm in a fast, compact Z-pinch discharge

1996 ◽  
Vol 14 (4) ◽  
pp. 679-684 ◽  
Author(s):  
T. Wagner ◽  
E. Eberl ◽  
D.H.H. Hoffmann
Keyword(s):  
Small Diameter ◽  
Gain Coefficient ◽  
Tube Length ◽  
Pinch Plasma ◽  
Gain Length ◽  
Z Pinch

Evidence of gain in a recombining Z-pinch plasma has been obtained at 52 and 49.8 nm. The amplified XUV radiation originated from the 4f-3d and the 4d-3p transitions of Lilike oxygen, OVI. The plasmas were generated in a small diameter Z-pinch discharge with moderate currents of 40 kA. The gain coefficient was determined by variation of the pinch tube length, leading to a gain-length product of 2.5 (4f-3d) and of 2.2 (4d-3p) for a length of 9 cm.

scholarly journals Study on W wire array Z pinch plasma radiation at Qiangguang-Ⅰ facility

2006 ◽  
Vol 55 (11) ◽  
pp. 5917
Author(s):  
Qiu Ai-Ci ◽  
Kuai Bin ◽  
Zeng Zheng-Zhong ◽  
Wang Wen-Sheng ◽  
Qiu Meng-Tong ◽  
...  
Keyword(s):  
Wire Array ◽  
Plasma Radiation ◽  
Pinch Plasma ◽  
Z Pinch

scholarly journals Ion Acceleration Independent of the Electric Current Direction in Z-Pinch Plasma

2011 ◽  
Vol 6 ◽  
pp. 1201009-1201009 ◽  
Author(s):  
Mineyuki NISHIO ◽  
Hiroshi SAKUMA ◽  
Keiichi TAKASUGI
Keyword(s):  
Electric Current ◽  
Ion Acceleration ◽  
Current Direction ◽  
Pinch Plasma ◽  
Z Pinch

Characterization of Solid Tin Target for Gas Discharges Produced EUV Plasmas

2007 ◽  
Vol 121-123 ◽  
pp. 885-888
Author(s):  
C.H. Zhang ◽  
S. Katsuki ◽  
J.G. Shi ◽  
H. Horita ◽  
T. Namihira ◽  
...  
Keyword(s):  
Electric Energy ◽  
Target Material ◽  
Pulsed Current ◽  
Gas Discharges ◽  
Pinch Plasma ◽  
Euv Emission ◽  
Pinhole Imaging ◽  
Background Gas ◽  
Z Pinch

In the development of our Z-pinch plasma EUV source, xenon (Xe) is used for the background gas discharges, and a solid tin (Sn) rod is used as target material due to its potential of high convention efficiency (CE) from input electric energy to EUV radiation [1, 2]. The Z-pinch plasma was driven by pulsed current with amplitude of 30 kA and pulse duration of 110 ns. Pinhole imaging, EUV spectrograph and in-band EUV energy monitor were used to characterize the EUV emission from the Z-pinch discharge. The experimental analyses have demonstrated the CE was as high as 3% [3].

He II Balmer series line shifts in a dense z-pinch plasma

1988 ◽  
Vol 21 (20) ◽  
pp. 3357-3367 ◽  
Author(s):  
J P Marangos ◽  
D D Burgess ◽  
K G H Baldwin
Keyword(s):  
Balmer Series ◽  
Pinch Plasma ◽  
Z Pinch

Elliptically Bent Crystal Spectrometer for Z-Pinch Plasma X-Ray

2009 ◽  
Vol 36 (1) ◽  
pp. 115-118
Author(s):  
王洪建 Wang Hongjian ◽  
肖沙里 Xiao Shali ◽  
施军 Shi Jun ◽  
黄显宾 Huang Xianbin ◽  
杨礼兵 Yang Libing ◽  
...  
Keyword(s):  
Crystal Spectrometer ◽  
X Ray ◽  
Pinch Plasma ◽  
Bent Crystal ◽  
Z Pinch
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