Characterization of Solid Tin Target for Gas Discharges Produced EUV Plasmas

2007 ◽  
Vol 121-123 ◽  
pp. 885-888
Author(s):  
C.H. Zhang ◽  
S. Katsuki ◽  
J.G. Shi ◽  
H. Horita ◽  
T. Namihira ◽  
...  
Keyword(s):  
Electric Energy ◽  
Target Material ◽  
Pulsed Current ◽  
Gas Discharges ◽  
Pinch Plasma ◽  
Euv Emission ◽  
Pinhole Imaging ◽  
Background Gas ◽  
Z Pinch

In the development of our Z-pinch plasma EUV source, xenon (Xe) is used for the background gas discharges, and a solid tin (Sn) rod is used as target material due to its potential of high convention efficiency (CE) from input electric energy to EUV radiation [1, 2]. The Z-pinch plasma was driven by pulsed current with amplitude of 30 kA and pulse duration of 110 ns. Pinhole imaging, EUV spectrograph and in-band EUV energy monitor were used to characterize the EUV emission from the Z-pinch discharge. The experimental analyses have demonstrated the CE was as high as 3% [3].

HIGH-POWER EUV SOURCE FOR LITHOGRAPHY USING A TIN TARGET

2006 ◽  
Vol 05 (06) ◽  
pp. 677-682 ◽  
Author(s):  
C. H. ZHANG ◽  
S. KATSUKI ◽  
A. KIMURA ◽  
H. HORITA ◽  
T. NAMIHIRA ◽  
...  
Keyword(s):  
Conversion Efficiency ◽  
High Power ◽  
Extreme Ultraviolet ◽  
Capillary Discharge ◽  
High Conversion Efficiency ◽  
Euv Emission ◽  
Pinhole Imaging ◽  
Background Gas ◽  
Next Generation Lithography ◽  
Z Pinch

Xenon capillary discharge sources are being developed for extreme ultraviolet (EUV) light for next generation lithography. However, the current sources generate in-band (2%), 2π EUV emission with conversion efficiency (CE) of <1%. Here we report progress in the development of a Z-pinch EUV source using a tin target, which was found to have significant potential for high conversion efficiency with wavelength of 13.5 nm. Xenon was used as the background gas, the experiments show that the magnitude of the EUV emission depended on not only the distance between the plasma and the rod surface, but also the pulse repetition rate of the discharge. Pinhole imaging, an EUV spectrograph and an in-band EUV energy monitor were used to characterize the EUV emission from the Z-pinch discharge.

Characterization of SiC and Al2O3 Ceramics Exposed to Nitrogen Ions from Inverse-Z Pinch Plasma Discharge

2017 ◽  
Author(s):  
Mauricio A. Algatti ◽  
Carlos N. Santos ◽  
Rogerio P. Mota ◽  
Elson de Campos ◽  
Emerson F. Lucena ◽  
...  
Keyword(s):  
Plasma Discharge ◽  
Pinch Plasma ◽  
Nitrogen Ions ◽  
Z Pinch

Formation of a sheared flow z-pinch plasma

2001 ◽  
Author(s):  
R. Golingo ◽  
U. Shumlak ◽  
B. Nelson
Keyword(s):  
Pinch Plasma ◽  
Sheared Flow ◽  
Z Pinch

scholarly journals Characterization of actinide resin for separation of 51,52gMn from bulk target material

2021 ◽  
Author(s):  
Kendall E. Barrett ◽  
Eduardo Aluicio-Sarduy ◽  
Steffen Happel ◽  
Aeli P. Olson ◽  
Christopher J. Kutyreff ◽  
...  
Keyword(s):  
Target Material ◽  
Bulk Target

scholarly journals Development and characterization of a Z-pinch-driven hohlraum high-yield inertial confinement fusion target concept

2001 ◽  
Vol 8 (5) ◽  
pp. 2257-2267 ◽  
Author(s):  
Michael E. Cuneo ◽  
Roger A. Vesey ◽  
John L. Porter ◽  
Gordon A. Chandler ◽  
David L. Fehl ◽  
...  
Keyword(s):  
Inertial Confinement Fusion ◽  
High Yield ◽  
Inertial Confinement ◽  
Target Concept ◽  
Confinement Fusion ◽  
Fusion Target ◽  
Z Pinch ◽  
Inertial Confinement Fusion Target

Design and Characterization of a New MV PLC Coupler for Smart Electric Energy Systems

2018 ◽  
Author(s):  
Giovanni Artale ◽  
Antonio Cataliotti ◽  
Valentina Cosentino ◽  
Salvatore Guaiana ◽  
Dario Di Cara ◽  
...  
Keyword(s):  
Electric Energy ◽  
Energy Systems

Preliminary investigation on the use of low current pulsed power Z-pinch plasma devices for the study of early stage plasma instabilities

2017 ◽  
Vol 60 (1) ◽  
pp. 014031 ◽  
Author(s):  
E Kaselouris ◽  
V Dimitriou ◽  
I Fitilis ◽  
A Skoulakis ◽  
G Koundourakis ◽  
...  
Keyword(s):  
Early Stage ◽  
Preliminary Investigation ◽  
Pulsed Power ◽  
Plasma Instabilities ◽  
Pinch Plasma ◽  
Z Pinch

scholarly journals Evidence for recombination XUV lasing at 52.0 nm and 49.8 nm in a fast, compact Z-pinch discharge

1996 ◽  
Vol 14 (4) ◽  
pp. 679-684 ◽  
Author(s):  
T. Wagner ◽  
E. Eberl ◽  
D.H.H. Hoffmann
Keyword(s):  
Small Diameter ◽  
Gain Coefficient ◽  
Tube Length ◽  
Pinch Plasma ◽  
Gain Length ◽  
Z Pinch

Evidence of gain in a recombining Z-pinch plasma has been obtained at 52 and 49.8 nm. The amplified XUV radiation originated from the 4f-3d and the 4d-3p transitions of Lilike oxygen, OVI. The plasmas were generated in a small diameter Z-pinch discharge with moderate currents of 40 kA. The gain coefficient was determined by variation of the pinch tube length, leading to a gain-length product of 2.5 (4f-3d) and of 2.2 (4d-3p) for a length of 9 cm.

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