The topography of organic light-emitting diode-component functional layers as studied by atomic force microscopy

2004 ◽  
Vol 14 (4) ◽  
pp. 155-157 ◽  
Author(s):  
Oksana V. Kotova ◽  
Svetlana V. Eliseeva ◽  
Elena V. Perevedentseva ◽  
Tatyana F. Limonova ◽  
Raida A. Baigeldieva ◽  
...  
Nano Letters ◽  
2007 ◽  
Vol 7 (12) ◽  
pp. 3645-3649 ◽  
Author(s):  
Yiying Zhao ◽  
Kwang H. An ◽  
Shuo Chen ◽  
Brendan O'Connor ◽  
Kevin P. Pipe ◽  
...  

2014 ◽  
Vol 25 (19) ◽  
pp. 195401 ◽  
Author(s):  
Chun-Ying Huang ◽  
Yung-Chi Yao ◽  
Ya-Ju Lee ◽  
Tai-Yuan Lin ◽  
Wen-Jang Kao ◽  
...  

2013 ◽  
Vol 2013 ◽  
pp. 1-5 ◽  
Author(s):  
Chien-Jung Huang ◽  
Kan-Lin Chen ◽  
Po-Wen Sze ◽  
Wen-Ray Chen ◽  
Teen-Hang Meen ◽  
...  

An ultrathin hole-injection buffer layer (HBL) using silicon dioxide (SiO2) by electron beam evaporation in flexible organic light-emitting diode (FOLED) has been fabricated. While the current of the device at constant driving voltage decreases as increasing SiO2thickness. Compared to the different thicknesses of the buffer layer, the FOLED with the buffer layer of 4 nm showed the highest luminous efficiency. The atomic force microscopy (AFM) investigation of indium tin oxide (ITO)/SiO2topography reveals changes at the interface between SiO2and N,N′-bis-(1-naphthl)-diphenyl-1,1′-bipheny-4,4′-diamine (NPB), resulting in ultrathin SiO2layers being a clear advantage for a FOLED. However, the SiO2can be expected to be a good buffer layer material and thus enhance the emission performance of the FOLED.


PIERS Online ◽  
2007 ◽  
Vol 3 (6) ◽  
pp. 821-824 ◽  
Author(s):  
Chien-Chang Tseng ◽  
Liang-Wen Ji ◽  
Yu Sheng Tsai ◽  
Fuh-Shyang Juang

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