Large-Scale Plasma Source Ion Implantation Program for Improving Mechanical Properties of Automotive Parts and Tooling

1993 ◽  
Vol 8 (5-6) ◽  
pp. 89-91 ◽  
Keyword(s):  
Mechanical Properties ◽  
Ion Implantation ◽  
Large Scale ◽  
Plasma Source ◽  
Plasma Source Ion Implantation ◽  
Automotive Parts

Design of a large-scale plasma source ion implantation experiment

1993 ◽  
Author(s):  
B.P. Wood ◽  
D.J. Rej ◽  
I. Henins ◽  
J.T. Scheuer ◽  
W.A. Reass ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Large Scale ◽  
Plasma Source ◽  
Plasma Source Ion Implantation

Optimum tribological improvement of aluminum using oxygen plasma source ion implantation

2003 ◽  
Vol 18 (8) ◽  
pp. 1761-1764 ◽  
Author(s):  
M. Bolduc ◽  
B. Terreault ◽  
A. Reguer ◽  
E. Shaffer ◽  
R. G. St-Jacques
Keyword(s):  
Mechanical Properties ◽  
Ion Implantation ◽  
Metal Oxide ◽  
Tribological Properties ◽  
Oxygen Plasma ◽  
Plasma Source ◽  
Emerging Technology ◽  
Process Temperature ◽  
Test Results ◽  
Plasma Source Ion Implantation

Aluminum and its alloys show poor tribological properties. Oxygen plasma source ion implantation is an emerging technology for the improvement of the surface mechanical properties of these materials. We found an optimum O ion dose, corresponding to 35 at.% O, for which we were able to obtain nanohardness enhancements by factors of 2× and 3× for pure and alloyed (AA7075) Al, respectively. Nanoscratch test results showed reductions in the scratch depths and the friction coefficients by nearly the same factors. It is also important to control the process temperature (∼160 °C). These improvements are due to the formation of a smooth, stiff, but nonbrittle metal–oxide (Al–Al2O3) nanocomposite.

Design of a Large-Scale Plasma Source Ion Implantation Experiment

1992 ◽  
Vol 279 ◽  
Author(s):  
B. P. Wood ◽  
J. T. Scheuer ◽  
M. A. Nastasi ◽  
R. H. Olsher ◽  
W. A. Reass ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Large Scale ◽  
National Laboratory ◽  
Secondary Electron Emission ◽  
Plasma Source ◽  
Particle In Cell ◽  
Surface Areas ◽  
Weakly Ionized ◽  
Plasma Source Ion Implantation ◽  
Small Targets

ABSTRACTIn Plasma Source Ion Implantation (PSII), a target to be implanted is immersed in a weakly ionized plasma and pulsed to a high negative voltage. Ions in the plasma are accelerated toward the target and implanted in its surface, thereby modifying the properties of the surface. Experimental results reported in the literature have generally been for small targets. We present here the design of a large-scale PSII experiment being assembled Los Alamos National Laboratory, in which we plan to implant targets with surface areas exceeding 1 m2 to doses of up to 5 × 1017 cm−2. In presenting this design, we use Monte Carlo and particle-in-cell simulations to examine sheath expansion, implant current and dose, secondary electron emission, target sputtering, implant depth, and x-ray emission resulting from secondary electrons hitting the vacuum chamber wall.

scholarly journals First Results from the Los Alamos Plasma Source Ion Implantation Experiment

1993 ◽  
Vol 316 ◽  
Author(s):  
D. J. Rej ◽  
J. R. Conrad ◽  
R. J. Faehl ◽  
R. J. Gribble ◽  
I. Henins ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Large Scale ◽  
Surface Hardness ◽  
Plasma Source ◽  
Plasma Electron ◽  
Los Alamos ◽  
Particle In Cell ◽  
Surface Areas ◽  
Plasma Source Ion Implantation ◽  
First Results

ABSTRACTA new facility is operational at Los Alamos to examine plasma source ion implantation on a large scale. Large workpieces can be treated in a 1.5-m-diameter, 4.6-m-Jong plasma vacuum chamber. Primary emphasis is directed towards improving tribological properties of metal surfaces. First experiments have been performed at 40 kV with nitrogen plasmas. Both coupons and manufactured components, with surface areas up to 4 m2, have been processed. Composition and surface hardness of implanted materials are evaluated. Implant conformality and dose uniformity into practical geometries are estimated with multidimensional particle-in-cell computations of plasma electron and ion dynamics, and Monte Carlo simulations of ion transport in solids.

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