The structural and dielectric properties of SiOx/a-C,F/SiOx multi-layer thin films deposited by microwave electron cyclotron resonance plasma method

2005 ◽  
Vol 472 (1-2) ◽  
pp. 44-48 ◽  
Author(s):  
Y. Xin ◽  
Z.Y. Ning ◽  
C. Ye ◽  
S.H. Xu ◽  
J. Chen ◽  
...  
Keyword(s):  
Thin Films ◽  
Dielectric Properties ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Plasma Method ◽  
Resonance Plasma

scholarly journals Deposition of low temperature Si-based insulators by the electron cyclotron resonance plasma method

1998 ◽  
Vol 317 (1-2) ◽  
pp. 116-119 ◽  
Author(s):  
S Garcia ◽  
J.M Martin ◽  
I Martil ◽  
M Fernandez ◽  
G Gonzalez-Diaz
Keyword(s):  
Low Temperature ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Plasma Method ◽  
Resonance Plasma
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