Characteristics of ITO Thin Films for the Plasma Display Panel Prepared by a MF Dual Magnetron Sputtering in the Oxygen Atmosphere

2009 ◽  
Vol 499 (1) ◽  
pp. 178/[500]-184/[506]
Author(s):  
Jung Hyun Lee ◽  
Sang Ho Sohn ◽  
Ji Hyun Moon ◽  
Myung Sub Park ◽  
Sang Gul Lee
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Oxygen Atmosphere ◽  
Plasma Display Panel ◽  
Ito Thin Films ◽  
Plasma Display

Characteristics of Ion Beam Assisted ITO Thin Films Deposited by RF Magnetron Sputtering

2014 ◽  
Vol 601 (1) ◽  
pp. 57-63 ◽  
Author(s):  
Kyong Chan Heo ◽  
Phil Kook Son ◽  
Youngku Sohn ◽  
Jonghoon Yi ◽  
Jin Hyuk Kwon ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Ion Beam ◽  
Rf Magnetron Sputtering ◽  
Ito Thin Films

Formation of ITO Thin Films by MF Magnetron Sputtering for Solar Cells Application

2021 ◽  
Author(s):  
Evgeniy Goncharov ◽  
Aleksandr Sayenko ◽  
Sergey Malyukov ◽  
Aleksandr Palii
Keyword(s):  
Thin Films ◽  
Solar Cells ◽  
Magnetron Sputtering ◽  
Ito Thin Films

Characteristics of ITO Thin Films for Organic Light Emitting Diode by using a Low-Frequency Magnetron Sputtering Method

2007 ◽  
Vol 470 (1) ◽  
pp. 251-257 ◽  
Author(s):  
Myung Chan Kim ◽  
Sang Ho Sohn ◽  
Duck Kyu Park ◽  
Sang Kooun Jung ◽  
Eun Lyoung Kim ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Light Emitting Diode ◽  
Low Frequency ◽  
Light Emitting ◽  
Organic Light Emitting Diode ◽  
Organic Light ◽  
Ito Thin Films

The effect of post-annealing under CdCl2 atmosphere on the properties of ITO thin films deposited by DC magnetron sputtering

2009 ◽  
Vol 21 (5) ◽  
pp. 441-444 ◽  
Author(s):  
Shenghao Wang ◽  
Jingquan Zhang ◽  
Bo Wang ◽  
Lianghuan Feng ◽  
Yaping Cai ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Post Annealing ◽  
Ito Thin Films

INFLUENCE OF SUBSTRATE TEMPERATURE ON STRUCTURAL, ELECTRICAL AND OPTICAL PROPERTIES OF ITO THIN FILMS PREPARED BY RF MAGNETRON SPUTTERING

2013 ◽  
Vol 20 (05) ◽  
pp. 1350045 ◽  
Author(s):  
BO HE ◽  
LEI ZHAO ◽  
JING XU ◽  
HUAIZHONG XING ◽  
SHAOLIN XUE ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Visible Region ◽  
Rf Magnetron Sputtering ◽  
Electrical And Optical Properties ◽  
High Quantum Efficiency ◽  
Ito Thin Films ◽  
Ito Films

In this paper, we investigated indium-tin-oxide (ITO) thin films on glass substrates deposited by RF magnetron sputtering using ceramic target to find the optimal condition for fabricating optoelectronic devices. The structural, electrical and optical properties of the ITO films prepared at various substrate temperatures were investigated. The results indicate the grain size increases with substrate temperature increases. As the substrate temperature grew up, the resistivity of ITO films greatly decreased. The ITO film possesses high quality in terms of electrode functions, when substrate temperature is 480°C. The resistivity is as low as 9.42 × 10-5 Ω• cm , while the carrier concentration and mobility are as high as 3.461 × 1021 atom∕cm3 and 19.1 cm2∕V⋅s, respectively. The average transmittance of the film is about 95% in the visible region. The novel ITO/np-Silicon frame, which prepared by RF magnetron sputtering at 480°C substrate temperature, can be used not only for low-cost solar cell, but also for high quantum efficiency of UV and visible lights enhanced photodetector for various applications.

On the synthesis of ultra smooth ITO thin films by conventional direct current magnetron sputtering

2008 ◽  
Vol 516 (7) ◽  
pp. 1334-1340 ◽  
Author(s):  
U. Betz ◽  
M. Kharrazi Olsson ◽  
J. Marthy ◽  
M.F. Escolá
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Direct Current Magnetron Sputtering ◽  
Ito Thin Films
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