Uncertainties on distance and chromatic dispersion measurement using optical low-coherence reflectometry

Metrologia ◽  
2008 ◽  
Vol 45 (1) ◽  
pp. 83-92 ◽  
Author(s):  
A-F Obaton ◽  
A Quoix ◽  
J Dubard
2007 ◽  
Vol 32 (9) ◽  
pp. 1029 ◽  
Author(s):  
Philippe Hamel ◽  
Yves Jaouën ◽  
Renaud Gabet ◽  
Siddharth Ramachandran

1993 ◽  
Vol 324 ◽  
Author(s):  
Chris M. Lawson ◽  
Robert R. Michael

AbstractWe report on the first use of optical low coherence reflectometry (OLCR) for Edge Defined Film-Fed Growth (EFG) silicon characterization. This OLCR sensor system has been used to measure horizontal profiles of silicon thickness and flatness to an accuracy of 1.5 Rim with the sensor head positioned 1 cm away from the silicon. The use of this noninvasive sensor for EFG silicon growth monitoring may lead to more efficient solar cell manufacturing processes.


1998 ◽  
Vol 154 (1-3) ◽  
pp. 1-4 ◽  
Author(s):  
J Szydlo ◽  
N Delachenal ◽  
R Gianotti ◽  
R Wälti ◽  
H Bleuler ◽  
...  

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