Rapid thermal low-pressure metalorganic chemical vapour deposition of local diffused W(Zn) contacts

Semiconductor Science and Technology ◽

10.1088/0268-1242/8/7/040 ◽

1993 ◽

Vol 8 (7) ◽

pp. 1445-1450

Author(s):

A Katz ◽

A Feingold ◽

A El-Roy ◽

N Moriya ◽

S J Pearton ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Room-Temperature Ferromagnetism of Ga 1− x Mn x N Grown by Low-Pressure Metalorganic Chemical Vapour Deposition

Chinese Physics Letters ◽

10.1088/0256-307x/23/5/061 ◽

2006 ◽

Vol 23 (5) ◽

pp. 1286-1288 ◽

Author(s):

Chen Zhi-Tao ◽

Su Yue-Yong ◽

Yang Zhi-Jian ◽

Zhang Yan ◽

Zhang Bin ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Room Temperature ◽

Vapour Deposition ◽

Room Temperature Ferromagnetism ◽

Chemical Vapour ◽

Low Pressure ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Optical and electrical quality of InGaP grown on GaAs with low pressure metalorganic chemical vapour deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(92)90347-l ◽

1992 ◽

Vol 125 (1-2) ◽

pp. 336-346 ◽

Author(s):

P.R. Hageman ◽

A. van Geelen ◽

W. Gabriëlse ◽

G.J. Bauhuis ◽

L.J. Giling

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Growth of low-resistivity high-quality ZnSe, ZnS films by low-pressure metalorganic chemical vapour deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(85)90110-1 ◽

1985 ◽

Vol 72 (1-2) ◽

pp. 13-16 ◽

Author(s):

A. Yoshikawa ◽

S. Yamaga ◽

K. Tanaka ◽

H. Kasai

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

High Quality ◽

Low Resistivity ◽

Metalorganic Chemical Vapour Deposition ◽

Zns Films ◽

Metalorganic Chemical

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Growth of FeS2 (pyrite) thin films on single crystalline substrates by low pressure metalorganic chemical vapour deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(94)00528-1 ◽

1995 ◽

Vol 146 (1-4) ◽

pp. 630-635 ◽

Author(s):

B. Thomas ◽

C. Höpfner ◽

K. Ellmer ◽

S. Fiechter ◽

H. Tributsch

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Single Crystalline ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical ◽

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Room temperature CW operation of GaInAsP/InP double-heterostructure diode lasers emitting at 1.23 μm grown by low-pressure metalorganic chemical vapour deposition

Electronics Letters ◽

10.1049/el:19810420 ◽

1981 ◽

Vol 17 (17) ◽

pp. 597 ◽

Author(s):

M. Razeghi ◽

J.P. Hirtz ◽

P. Hirtz ◽

J.P. Larivain ◽

R. Bondeau ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Room Temperature ◽

Vapour Deposition ◽

Diode Lasers ◽

Chemical Vapour ◽

Low Pressure ◽

Double Heterostructure ◽

Cw Operation ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Growth of epitaxial and highly oriented thin films of cadmium and cadmium zinc sulfide by low-pressure metalorganic chemical vapour deposition using diethyldithiocarbamates

Journal of Crystal Growth ◽

10.1016/0022-0248(89)90662-3 ◽

1989 ◽

Vol 96 (4) ◽

pp. 989-992 ◽

Author(s):

Dario M. Frigo ◽

Omar F.Z. Khan ◽

Paul O'Brien

Keyword(s):

Zinc Sulfide ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Cadmium Zinc Sulfide ◽

Metalorganic Chemical Vapour Deposition ◽

Cadmium Zinc ◽

Metalorganic Chemical

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Microstructural study of very low resistivity TiNxfilms formed by rapid thermal low-pressure metalorganic chemical vapour deposition on InP

Semiconductor Science and Technology ◽

10.1088/0268-1242/8/3/026 ◽

1993 ◽

Vol 8 (3) ◽

pp. 450-458

Author(s):

A Katz ◽

A Feingold ◽

S Nakahara ◽

S J Pearton ◽

E Lane ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Microstructural Study ◽

Low Resistivity ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Effect of annealing on ZnO thin films grown on (001) silicon substrate by low-pressure metalorganic chemical vapour deposition

Semiconductor Science and Technology ◽

10.1088/0268-1242/19/6/017 ◽

2004 ◽

Vol 19 (6) ◽

pp. 755-758 ◽

Author(s):

Yuantao Zhang ◽

Guotong Du ◽

Xiaotian Yang ◽

Baijun Zhao ◽

Yan Ma ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Silicon Substrate ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Zno Thin Films ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Fabrication and photoluminescence properties of ZnTe and CdZnTe films by low pressure metalorganic chemical-vapour deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(88)90601-x ◽

1988 ◽

Vol 93 (1-4) ◽

pp. 667-672 ◽

Author(s):

Mitsuru Ekawa ◽

Yoichi Kawakami ◽

Tsunemasa Taguchi ◽

Akio Hiraki

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Photoluminescence Properties ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Physical properties of CdTe grown on Si by low pressure metalorganic chemical vapour deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(86)90339-8 ◽

1986 ◽

Vol 77 (1-3) ◽

pp. 475-479 ◽

Author(s):

Min-Shyong Lin ◽

Rey-Lin Chou ◽

Kan-Sen Chou

Keyword(s):

Physical Properties ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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