Effective-mass approach for n-type semiconductor nanowire MOSFETs arbitrarily oriented

2007 ◽  
Vol 18 (25) ◽  
pp. 255201 ◽  
Author(s):  
Marc Bescond ◽  
Nicolas Cavassilas ◽  
Michel Lannoo
2010 ◽  
Vol 133 (10) ◽  
pp. 104704 ◽  
Author(s):  
S. Yu. Kruchinin ◽  
A. V. Fedorov ◽  
A. V. Baranov ◽  
T. S. Perova ◽  
K. Berwick

2009 ◽  
Vol 19 (01) ◽  
pp. 15-22
Author(s):  
LINGQUAN (DENNIS) WANG ◽  
BO YU ◽  
PETER M. ASBECK ◽  
YUAN TAUR ◽  
MARK RODWELL

This paper describes analysis and simulations of Si and III-V Gate-All-Around nanowire MOSFETS assuming ballistic or quasi-ballistic transport. It is found that either channel material can provide the higher saturation current depending on the oxide thickness. For effective oxide thickness above approximately 0.5nm, the higher electron velocity of III-V's outweighs the higher density of states available in the Si device associated with higher effective mass and valley degeneracy and result in higher current for the III-V device. However, materials with higher effective mass and valley degeneracy result in smaller on-resistance in ballistic limit. Depending on the gate oxide capacitance, valley degeneracy may influence the attainable saturation current in a positive or negative way.


2008 ◽  
Vol 104 (10) ◽  
pp. 104309 ◽  
Author(s):  
S. Rodríguez-Bolívar ◽  
F. M. Gómez-Campos ◽  
J. E. Carceller

2007 ◽  
Vol 127 (11) ◽  
pp. 114317 ◽  
Author(s):  
E. I. Dashevskaya ◽  
I. Litvin ◽  
E. E. Nikitin ◽  
J. Troe

2007 ◽  
Vol 91 (1) ◽  
pp. 012104 ◽  
Author(s):  
Hidenori Hiramatsu ◽  
Kazushige Ueda ◽  
Hiromichi Ohta ◽  
Masahiro Hirano ◽  
Maiko Kikuchi ◽  
...  

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