Electron density measurements on an inductively coupled plasma with a one-port microwave interferometer

Plasma Sources Science and Technology ◽

10.1088/0963-0252/21/5/055032 ◽

2012 ◽

Vol 21 (5) ◽

pp. 055032 ◽

Author(s):

M Andrasch ◽

J Ehlbeck ◽

R Foest ◽

K-D Weltmann

Keyword(s):

Electron Density ◽

Inductively Coupled Plasma ◽

Density Measurements ◽

Inductively Coupled

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Comparison of Terahertz time domain spectroscopy and laser Thomson scattering for electron density measurements in inductively coupled plasma discharges

Journal of Instrumentation ◽

10.1088/1748-0221/14/12/c12019 ◽

2019 ◽

Vol 14 (12) ◽

pp. C12019-C12019

Author(s):

Y. Zhao ◽

Y. Wang ◽

J. Shi ◽

D. Wu ◽

C. Feng ◽

...

Keyword(s):

Electron Density ◽

Time Domain ◽

Inductively Coupled Plasma ◽

Thomson Scattering ◽

Plasma Discharges ◽

Terahertz Time Domain Spectroscopy ◽

Time Domain Spectroscopy ◽

Density Measurements ◽

Inductively Coupled

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Time-Resolved Electron Density Measurements of the Rise Cycle in a Pulsed Inductively Coupled Plasma

2017 IEEE International Conference on Plasma Science (ICOPS) ◽

10.1109/plasma.2017.8496046 ◽

2017 ◽

Author(s):

Joel Brandon ◽

Kris Ford ◽

David Peterson ◽

Steven Shannon

Keyword(s):

Electron Density ◽

Inductively Coupled Plasma ◽

Time Resolved ◽

Density Measurements ◽

Inductively Coupled

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Time-Resolved Electron Density Measurement Characterization of E–H-Modes for Inductively Coupled Plasma Instabilities

IEEE Transactions on Plasma Science ◽

10.1109/tps.2019.2909476 ◽

2019 ◽

Vol 47 (5) ◽

pp. 2102-2109 ◽

Author(s):

David J. Coumou ◽

Shaun T. Smith ◽

David J. Peterson ◽

Steven C. Shannon

Keyword(s):

Electron Density ◽

Inductively Coupled Plasma ◽

Density Measurement ◽

Plasma Instabilities ◽

Time Resolved ◽

Inductively Coupled

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Comparison of electron density measurements by using a plasma absorption probe and a double Langmuir probe in inductively coupled plasmas

The 30th International Conference on Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. ◽

10.1109/plasma.2003.1228951 ◽

2003 ◽

Author(s):

Jung-Hyung Kim ◽

Sang-Chul Choi ◽

Yong-Hyun Shin ◽

Kwang-Hwa Chung

Keyword(s):

Electron Density ◽

Langmuir Probe ◽

Inductively Coupled Plasmas ◽

Density Measurements ◽

Inductively Coupled ◽

Plasma Absorption ◽

Coupled Plasmas

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Some considerations regarding temperature, electron density, and ionization in the argon inductively coupled plasma

Spectrochimica Acta Part B Atomic Spectroscopy ◽

10.1016/0584-8547(82)80103-1 ◽

1982 ◽

Vol 37 (10) ◽

pp. 869-879 ◽

Author(s):

M.W. Blades

Keyword(s):

Electron Density ◽

Inductively Coupled Plasma ◽

Inductively Coupled ◽

Temperature Electron

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Excitation temperature and electron density in the inductively coupled plasma—aqueous vs organic solvent introduction

Spectrochimica Acta Part B Atomic Spectroscopy ◽

10.1016/0584-8547(85)80107-5 ◽

1985 ◽

Vol 40 (4) ◽

pp. 579-591 ◽

Author(s):

M.W. Blades ◽

B.L. Caughlin

Keyword(s):

Organic Solvent ◽

Electron Density ◽

Inductively Coupled Plasma ◽

Excitation Temperature ◽

Inductively Coupled

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Time-Resolved Electron Density Measurement Characterization of E-H Modes for Inductively Coupled Plasma Instabilities

10.1109/icops35962.2018.9575529 ◽

2018 ◽

Author(s):

David J. Coumou ◽

Shaun Smith ◽

Aung Toe ◽

Scott White ◽

Steven C. Shannon ◽

...

Keyword(s):

Electron Density ◽

Inductively Coupled Plasma ◽

Density Measurement ◽

Plasma Instabilities ◽

Time Resolved ◽

Inductively Coupled

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Effect of electron temperature and electron density on topography dependent charging (TDC) damage in inductively coupled plasma etching tool

1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) ◽

10.1109/ppid.1998.725605 ◽

2002 ◽

Author(s):

K. Tokashiki ◽

M. Araki ◽

M. Nagase ◽

K. Noguchi ◽

H. Miyamoto ◽

...

Keyword(s):

Electron Temperature ◽

Electron Density ◽

Plasma Etching ◽

Inductively Coupled Plasma ◽

Inductively Coupled Plasma Etching ◽

Inductively Coupled

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Spatial profiles of electron density in the inductively coupled plasma

Spectrochimica Acta Part B Atomic Spectroscopy ◽

10.1016/0584-8547(85)80068-9 ◽

1985 ◽

Vol 40 (7) ◽

pp. 987-993 ◽

Author(s):

B.L. Caughlin ◽

M.W. Blades

Keyword(s):

Electron Density ◽

Inductively Coupled Plasma ◽

Inductively Coupled

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Kinetic temperature and electron density measurement in an inductively coupled plasma torch using degenerate four-wave mixing

Applied Physics B ◽

10.1007/s00340-009-3440-0 ◽

2009 ◽

Vol 95 (1) ◽

pp. 161-168 ◽

Author(s):

J. Schafer ◽

W. Lyons ◽

W. G. Tong ◽

P. M. Danehy

Keyword(s):

Electron Density ◽

Inductively Coupled Plasma ◽

Plasma Torch ◽

Density Measurement ◽

Four Wave Mixing ◽

Kinetic Temperature ◽

Wave Mixing ◽

Inductively Coupled ◽

Degenerate Four Wave Mixing

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