Study on the Effect of Base Pressure on Magnetron Sputtering Discharge Plasma by Optical Emission Spectroscopy

2010 ◽  
Vol 12 (1) ◽  
pp. 35-40 ◽  
Author(s):  
S Yugeswaran ◽  
K Suresh ◽  
V Selvarajan
Keyword(s):  
Magnetron Sputtering ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Discharge Plasma ◽  
Optical Emission ◽  
Base Pressure

scholarly journals Spectroscopic diagnostic complex based on the magnetron sputtering device with a digital method of the data mining

2020 ◽  
Vol 2 (2) ◽  
pp. 1-8
Author(s):  
Afanasіeva I.A. ◽  
Afanasiev S.N. ◽  
Azarenkov N.A. ◽  
Bobkov V.V. ◽  
Gritsyna V.V. ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Plasma Parameter ◽  
Discharge Plasma ◽  
Emission Spectra ◽  
Optical Emission ◽  
Digital Processing ◽  
Magnetron Discharge ◽  
Diagnostic Complex

A diagnostic complex based on a magnetron sputtering device is proposed for studying a magnetron discharge plasma parameter by optical emission spectroscopy, using two spectroscopic systems: photographic and photoelectric. Software for digital processing of the obtained emission spectra is developed. The results obtained by the two spectroscopic systems are compared.

Correlation Between In Situ Optical Emission Spectroscopy in a Reactive O2 / AR RF Magnetron Sputtering Discharge and PZT Thin Film Composition

1997 ◽  
Vol 493 ◽  
Author(s):  
F. Ayguavives ◽  
P. Aubert ◽  
B. Ea-Kim ◽  
B. Agius
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Rf Magnetron Sputtering ◽  
Nuclear Reaction Analysis ◽  
Nominal Composition ◽  
Film Composition

ABSTRACTLead zirconate titanate (PZT) thin films have been grown by rf magnetron sputtering on Si substrates from a metallic target of nominal composition Pb1.1(Zr0.4 Ti0.6 in a reactive argon / oxygen gas mixture. During plasma deposition, in situ Optical Emission Spectroscopy (OES) measurements show clearly a correlation between the evolution of characteristic atomic emission line intensities (Zr - 386.4 nm, Ti - 399.9 nm, Pb - 405.8 nm and O - 777.2 nm) and the thin-film composition determined by a simultaneous use of Rutherford Backscattering Spectroscopy (RBS) and Nuclear Reaction Analysis (NRA).

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