Investigation of tunneling current and local contact potential difference on the TiO2(110) surface by AFM/KPFM at 78 K

2017 ◽  
Vol 28 (10) ◽  
pp. 105704 ◽  
Author(s):  
Huan Fei Wen ◽  
Yan Jun Li ◽  
Eiji Arima ◽  
Yoshitaka Naitoh ◽  
Yasuhiro Sugawara ◽  
...  
Nanomaterials ◽  
2020 ◽  
Vol 10 (8) ◽  
pp. 1506
Author(s):  
Huan Fei Wen ◽  
Yasuhiro Sugawara ◽  
Yan Jun Li

We studied the O2 dissociated state under the different O2 exposed temperatures with atomic resolution by scanning probe microscopy (SPM) and imaged the O adatom by simultaneous atomic force microscopy (AFM)/scanning tunneling microscopy (STM). The effect of AFM operation mode on O adatom contrast was investigated, and the interaction of O adatom and the subsurface defect was observed by AFM/STM. Multi-channel exploration was performed to investigate the charge transfer between the adsorbed O and the TiO2(110) by obtaining the frequency shift, tunneling current and local contact potential difference at an atomic scale. The tunneling current image showed the difference of the tunneling possibility on the single O adatom and paired O adatoms, and the local contact potential difference distribution of the O-TiO2(110) surface institutively revealed the charge transfer from TiO2(110) surface to O adatom. The experimental results are expected to be helpful in investigating surface/interface properties by SPM.


2009 ◽  
Vol 20 (26) ◽  
pp. 264012 ◽  
Author(s):  
S A Burke ◽  
J M LeDue ◽  
Y Miyahara ◽  
J M Topple ◽  
S Fostner ◽  
...  

2011 ◽  
Vol 99 (23) ◽  
pp. 233102 ◽  
Author(s):  
Evan J. Spadafora ◽  
Mathieu Linares ◽  
Wan Zaireen Nisa Yahya ◽  
Frédéric Lincker ◽  
Renaud Demadrille ◽  
...  

Nanomaterials ◽  
2021 ◽  
Vol 11 (7) ◽  
pp. 1803
Author(s):  
Zhen Zheng ◽  
Junyang An ◽  
Ruiling Gong ◽  
Yuheng Zeng ◽  
Jichun Ye ◽  
...  

In this work, we report the same trends for the contact potential difference measured by Kelvin probe force microscopy and the effective carrier lifetime on crystalline silicon (c-Si) wafers passivated by AlOx layers of different thicknesses and submitted to annealing under various conditions. The changes in contact potential difference values and in the effective carrier lifetimes of the wafers are discussed in view of structural changes of the c-Si/SiO2/AlOx interface thanks to high resolution transmission electron microscopy. Indeed, we observed the presence of a crystalline silicon oxide interfacial layer in as-deposited (200 °C) AlOx, and a phase transformation from crystalline to amorphous silicon oxide when they were annealed in vacuum at 300 °C.


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