The effects of process conditions on the plasma characteristic in radio-frequency capacitively coupled SiH4/NH3/N2plasmas: Two-dimensional simulations

2013 ◽  
Vol 22 (4) ◽  
pp. 045204
Author(s):  
Xiang-Mei Liu ◽  
Yuan-Hong Song ◽  
Wei Jiang ◽  
Lin Yi
1994 ◽  
Vol 64 (14) ◽  
pp. 1780-1782 ◽  
Author(s):  
P. M. Meijer ◽  
J. D. P. Passchier ◽  
W. J. Goedheer ◽  
J. Bezemer ◽  
W. G. J. H. M. van Sark

2002 ◽  
Vol 92 (5) ◽  
pp. 2290-2295 ◽  
Author(s):  
D. Herrebout ◽  
A. Bogaerts ◽  
M. Yan ◽  
R. Gijbels ◽  
W. Goedheer ◽  
...  

2018 ◽  
Vol 25 (9) ◽  
pp. 093501
Author(s):  
Wen-Zhu Jia ◽  
Rui-Qiang Liu ◽  
Xi-Feng Wang ◽  
Xiang-Mei Liu ◽  
Yuan-Hong Song ◽  
...  

1996 ◽  
Vol 80 (12) ◽  
pp. 7154-7156 ◽  
Author(s):  
M. Meyyappan ◽  
T. R. Govindan ◽  
J. P. Kreskovsky

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