The effects of process conditions on the plasma characteristic in radio-frequency capacitively coupled SiH4/NH3/N2plasmas: Two-dimensional simulations
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2002 ◽
Vol 11
(4)
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pp. 448-465
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2005 ◽
Vol 14
(2)
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pp. 209-218
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2005 ◽
Vol 33
(2)
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pp. 615-623
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2008 ◽
Vol 47
(8)
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pp. 6863-6866
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