A method to restrain the charging effect on an insulating substrate in high energy electron beam lithography

2014 ◽  
Vol 35 (12) ◽  
pp. 126002
Author(s):  
Mingyan Yu ◽  
Shirui Zhao ◽  
Yupeng Jing ◽  
Yunbo Shi ◽  
Baoqin Chen
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
High Energy ◽  
Energy Electron ◽  
High Energy Electron ◽  
Charging Effect

scholarly journals Influence of sub-100 nm scattering on high-energy electron beam lithography

2001 ◽  
Vol 19 (6) ◽  
pp. 2504 ◽  
Author(s):  
Erik H. Anderson ◽  
Deirdre L. Olynick ◽  
Weilun Chao ◽  
Bruce Harteneck ◽  
Eugene Veklerov
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
High Energy ◽  
Energy Electron ◽  
High Energy Electron

High-Energy Electron Beam Lithography of Octadecylphosphonic Acid Monolayers on Aluminum

Langmuir ◽  
2008 ◽  
Vol 24 (5) ◽  
pp. 2057-2063 ◽  
Author(s):  
Nikolaj Gadegaard ◽  
Xinyong Chen ◽  
Frank J. M. Rutten ◽  
Morgan R. Alexander
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
High Energy ◽  
Energy Electron ◽  
High Energy Electron ◽  
Octadecylphosphonic Acid

scholarly journals Fabrication of nanostructured transmissive optical devices on ITO-glass with UV1116 photoresist using high-energy electron beam lithography

2016 ◽  
Vol 27 (48) ◽  
pp. 485301 ◽  
Author(s):  
Calum Williams ◽  
Richard Bartholomew ◽  
Girish Rughoobur ◽  
George S D Gordon ◽  
Andrew J Flewitt ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
High Energy ◽  
Optical Devices ◽  
Energy Electron ◽  
High Energy Electron ◽  
Ito Glass
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