Metallic sputtering growth of high quality anatase phase TiO2 films by inductively coupled plasma assisted DC reactive magnetron sputtering

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2009.06.001 ◽

2009 ◽

Vol 203 (23) ◽

pp. 3661-3668 ◽

Author(s):

Z.G. Li ◽

Y.X. Wu ◽

S. Miyake

Keyword(s):

Magnetron Sputtering ◽

Inductively Coupled Plasma ◽

Anatase Phase ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

High Quality ◽

Inductively Coupled ◽

Dc Reactive Magnetron Sputtering

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Characteristics of N-doped TiO2 thin films grown on unheated glass substrate by inductively coupled plasma assisted dc reactive magnetron sputtering

Applied Surface Science ◽

10.1016/j.apsusc.2009.06.126 ◽

2009 ◽

Vol 255 (22) ◽

pp. 9149-9153 ◽

Author(s):

Z.G. Li ◽

S. Miyake

Keyword(s):

Magnetron Sputtering ◽

Glass Substrate ◽

Inductively Coupled Plasma ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Tio2 Thin Films ◽

Inductively Coupled ◽

Dc Reactive Magnetron Sputtering

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Plasma-Enhanced Reactive Magnetron Sputtering Assisted with Inductively Coupled Plasma for Reactivity-Controlled Deposition of Microcrystalline Silicon Thin Films

Japanese Journal of Applied Physics ◽

10.7567/jjap.52.11nb05 ◽

2013 ◽

Vol 52 (11S) ◽

pp. 11NB05 ◽

Author(s):

Kosuke Takenaka ◽

Yuichi Setsuhara ◽

Akinori Ebe

Keyword(s):

Magnetron Sputtering ◽

Inductively Coupled Plasma ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Microcrystalline Silicon ◽

Inductively Coupled ◽

Silicon Thin Films ◽

Controlled Deposition

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Photocatalytic Zn-doped TiO2 films prepared by DC reactive magnetron sputtering

Vacuum ◽

10.1016/j.vacuum.2007.04.036 ◽

2007 ◽

Vol 82 (3) ◽

pp. 328-335 ◽

Author(s):

Wenjie Zhang ◽

Shenglong Zhu ◽

Ying Li ◽

Fuhui Wang

Keyword(s):

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Dc Reactive Magnetron Sputtering

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Yttrium-doped TiO2 films prepared by means of DC reactive magnetron sputtering

Chemical Engineering Journal ◽

10.1016/j.cej.2009.06.039 ◽

2009 ◽

Vol 155 (1-2) ◽

pp. 83-87 ◽

Author(s):

Wenjie Zhang ◽

Kuanling Wang ◽

Shenglong Zhu ◽

Ying Li ◽

Fuhui Wang ◽

...

Keyword(s):

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Dc Reactive Magnetron Sputtering

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The effect of substrate temperature on high quality c-axis oriented AZO thin films prepared by DC reactive magnetron sputtering for photoelectric device applications

Superlattices and Microstructures ◽

10.1016/j.spmi.2013.10.003 ◽

2013 ◽

Vol 64 ◽

pp. 319-330 ◽

Author(s):

Bo He ◽

Jing Xu ◽

HuaiZhong Xing ◽

ChunRui Wang ◽

XiaoDong Zhang

Keyword(s):

Magnetron Sputtering ◽

Substrate Temperature ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

High Quality ◽

Photoelectric Device ◽

Dc Reactive Magnetron Sputtering ◽

Device Applications

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Effect of the substrate temperature on the crystallization of TiO2 films prepared by DC reactive magnetron sputtering

Journal of Crystal Growth ◽

10.1016/j.jcrysgro.2007.01.008 ◽

2007 ◽

Vol 300 (2) ◽

pp. 551-554 ◽

Author(s):

Yuanyuan Zhang ◽

Xiangyang Ma ◽

Peiliang Chen ◽

Deren Yang

Keyword(s):

Magnetron Sputtering ◽

Substrate Temperature ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Dc Reactive Magnetron Sputtering

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Influence of O2 partial pressure on the growth of nanostructured anatase phase TiO2 thin films prepared by DC reactive magnetron sputtering

Materials Chemistry and Physics ◽

10.1016/j.matchemphys.2010.12.008 ◽

2011 ◽

Vol 126 (1-2) ◽

pp. 73-81 ◽

Author(s):

S. Sério ◽

M.E. Melo Jorge ◽

M.J.P. Maneira ◽

Y. Nunes

Keyword(s):

Magnetron Sputtering ◽

Partial Pressure ◽

Anatase Phase ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Tio2 Thin Films ◽

O2 Partial Pressure ◽

Dc Reactive Magnetron Sputtering

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Low-temperature growth of gallium nitride films by inductively coupled-plasma-enhanced reactive magnetron sputtering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.4871472 ◽

2014 ◽

Vol 32 (3) ◽

pp. 031514 ◽

Author(s):

Chih-Jui Ni ◽

Franklin Chau-Nan Hong

Keyword(s):

Gallium Nitride ◽

Low Temperature ◽

Magnetron Sputtering ◽

Inductively Coupled Plasma ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Temperature Growth ◽

Low Temperature Growth ◽

Inductively Coupled

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Incorporation of N in TiO2 films grown by DC-reactive magnetron sputtering

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ◽

10.1016/j.nimb.2011.07.052 ◽

2012 ◽

Vol 273 ◽

pp. 109-112 ◽

Author(s):

S. Sério ◽

M.E. Melo Jorge ◽

Y. Nunes ◽

N.P. Barradas ◽

E. Alves ◽

...

Keyword(s):

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Dc Reactive Magnetron Sputtering

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Fabrication of TiO2 Films on Glass Substrates by a Pulsed Dc Reactive Magnetron Sputtering

Applied Mechanics and Materials ◽

10.4028/www.scientific.net/amm.71-78.5050 ◽

2011 ◽

Vol 71-78 ◽

pp. 5050-5053 ◽

Author(s):

Qi Min Wang ◽

Teng Fei Zhang ◽

Se Hun Kwon ◽

Kwang Ho Kim

Keyword(s):

Magnetron Sputtering ◽

Room Temperature ◽

Anatase Phase ◽

Gas Pressure ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Glass Substrates ◽

Pulsed Dc ◽

Dc Reactive Magnetron Sputtering ◽

Surface Morphologies

Due to its ability of photocatalysis and photoinduced superhydrophilicity, TiO2was paid significant attentions in recent years. In this study, TiO2films were deposited at room temperature and 300 °C by pulsed dc reactive magnetron sputtering. The gas pressure was varied in the range of 0.3-1.1 Pa by filling Ar/N2gas mixture with the ratio of 1:1. The surface morphologies, phase structure and optical property of the TiO2films were investigated. TiO2films with good crystalline quality containing mainly of anatase phase were obtained by deposition using gas pressure of 0.7 Pa at room temperature and gas pressure of 1.5 Pa at 300 °C.

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