Structure and optical parameters of Eu doped tellurium oxide thin films prepared by reactive magnetron sputtering method

Thin Solid Films ◽

10.1016/j.tsf.2019.137592 ◽

2019 ◽

Vol 691 ◽

pp. 137592 ◽

Cited By ~ 1

Author(s):

Marcin Łapiński ◽

Michalina Walas ◽

Anna Gapska ◽

Dorota Kulik ◽

Aneta Szmytke ◽

...

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Optical Parameters ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Tellurium Oxide

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Properties of nickel oxide thin films deposited by RF reactive magnetron sputtering

Thin Solid Films ◽

10.1016/s0040-6090(02)00654-5 ◽

2002 ◽

Vol 420-421 ◽

pp. 54-61 ◽

Cited By ~ 103

Author(s):

Y.M. Lu ◽

W.S. Hwang ◽

J.S. Yang ◽

H.C. Chuang

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Nickel Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Nickel Oxide Thin Films

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The growth of indium-tin-oxide thin films on glass substrates using DC reactive magnetron sputtering

Vacuum ◽

10.1016/j.vacuum.2003.08.001 ◽

2003 ◽

Vol 72 (3) ◽

pp. 269-276 ◽

Cited By ~ 28

Author(s):

Ho-Chul Lee ◽

Ji-Yoon Seo ◽

Yong-Won Choi ◽

Dong-Wook Lee

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Glass Substrates ◽

Dc Reactive Magnetron Sputtering

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Temperature dependence of the optical properties of mixed oxide thin films deposited by reactive magnetron sputtering

10.1117/12.625069 ◽

2005 ◽

Author(s):

M. Vergöhl ◽

B. Hunsche ◽

A. Ritz

Keyword(s):

Thin Films ◽

Optical Properties ◽

Magnetron Sputtering ◽

Temperature Dependence ◽

Mixed Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films

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Fabrication of low-resistive p-type Al–N co-doped zinc oxide thin films by RF reactive magnetron sputtering

Physica B Condensed Matter ◽

10.1016/j.physb.2009.08.170 ◽

2009 ◽

Vol 404 (23-24) ◽

pp. 4846-4849 ◽

Cited By ~ 16

Author(s):

Hsin-Chun Lu ◽

Jo-Ling Lu ◽

Chi-You Lai ◽

Gwo-Mei Wu

Keyword(s):

Thin Films ◽

Zinc Oxide ◽

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

P Type ◽

Co Doped

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Growth and Characterization of Tungsten Oxide Thin Films using the Reactive Magnetron Sputtering System

Journal of Inorganic and Organometallic Polymers and Materials ◽

10.1007/s10904-016-0380-0 ◽

2016 ◽

Vol 26 (4) ◽

pp. 889-894 ◽

Cited By ~ 8

Author(s):

S. Firoozbakht ◽

E. Akbarnejad ◽

A. Salar Elahi ◽

M. Ghoranneviss

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Tungsten Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Tungsten Oxide Thin Films ◽

Sputtering System

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Electrical and optical properties of tantalum oxide thin films prepared by reactive magnetron sputtering

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2011.08.019 ◽

2011 ◽

Vol 509 (41) ◽

pp. 9758-9763 ◽

Cited By ~ 12

Author(s):

A.X. Wei ◽

Z.X. Ge ◽

X.H. Zhao ◽

J. Liu ◽

Y. Zhao

Keyword(s):

Thin Films ◽

Optical Properties ◽

Magnetron Sputtering ◽

Tantalum Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Electrical And Optical Properties

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Comparison of transparent conductive oxide thin films prepared by a.c. and d.c. reactive magnetron sputtering

Surface and Coatings Technology ◽

10.1016/s0257-8972(97)00145-x ◽

1998 ◽

Vol 98 (1-3) ◽

pp. 1304-1314 ◽

Cited By ~ 134

Author(s):

S. Jäger ◽

B. Szyszka ◽

J. Szczyrbowski ◽

G. Bräuer

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Transparent Conductive Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Conductive Oxide

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An investigation of the surface energy and optical transmittance of copper oxide thin films prepared by reactive magnetron sputtering

Acta Materialia ◽

10.1016/j.actamat.2005.07.035 ◽

2005 ◽

Vol 53 (19) ◽

pp. 5151-5159 ◽

Cited By ~ 58

Author(s):

A.A. Ogwu ◽

E. Bouquerel ◽

O. Ademosu ◽

S. Moh ◽

E. Crossan ◽

...

Keyword(s):

Thin Films ◽

Surface Energy ◽

Magnetron Sputtering ◽

Copper Oxide ◽

Optical Transmittance ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films

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Physical properties of copper oxide thin films prepared by dc reactive magnetron sputtering under different oxygen partial pressures

Physica B Condensed Matter ◽

10.1016/j.physb.2009.08.185 ◽

2009 ◽

Vol 404 (23-24) ◽

pp. 4831-4834 ◽

Cited By ~ 38

Author(s):

Chun-Lung Chu ◽

Hsin-Chun Lu ◽

Chen-Yang Lo ◽

Chi-You Lai ◽

Yu-Hsiang Wang

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Physical Properties ◽

Copper Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Partial Pressures ◽

Dc Reactive Magnetron Sputtering

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Preparation of p-type transparent conducting tin-antimony oxide thin films by DC reactive magnetron sputtering

physica status solidi (c) ◽

10.1002/pssc.200778884 ◽

2008 ◽

Vol 5 (10) ◽

pp. 3364-3367 ◽

Cited By ~ 5

Author(s):

Zhenguo Ji ◽

Junhua Xi ◽

Lijuan Huo ◽

Yi Zhao

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Antimony Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Transparent Conducting ◽

Dc Reactive Magnetron Sputtering ◽

P Type

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