Cu2O/ZnO Heterojunction Solar Cells Fabricated by Magnetron-Sputter Deposition Method Films Using Sintered Ceramics Targets

Journal of Physics Conference Series ◽

10.1088/1742-6596/433/1/012027 ◽

2013 ◽

Vol 433 ◽

pp. 012027 ◽

Author(s):

S Noda ◽

H Shima ◽

H Akinaga

Keyword(s):

Solar Cells ◽

Sputter Deposition ◽

Deposition Method ◽

Heterojunction Solar Cells ◽

Magnetron Sputter Deposition ◽

Magnetron Sputter

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Resistive switching behaviour of amorphous silicon carbide thin films fabricated by a single composite magnetron sputter deposition method

Bulletin of Materials Science ◽

10.1007/s12034-020-02093-8 ◽

2020 ◽

Vol 43 (1) ◽

Author(s):

Poreddy Chaitanya Akshara ◽

Nilanjan Basu ◽

Jayeeta Lahiri ◽

Guruswamy Rajaram ◽

M Ghanashyam Krishna

Keyword(s):

Silicon Carbide ◽

Amorphous Silicon ◽

Resistive Switching ◽

Sputter Deposition ◽

Deposition Method ◽

Amorphous Silicon Carbide ◽

Switching Behaviour ◽

Magnetron Sputter Deposition ◽

Magnetron Sputter

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Microstructural evolution and Poisson ratio of epitaxial ScN grown on TiN(001)/MgO(001) by ultrahigh vacuum reactive magnetron sputter deposition

Journal of Applied Physics ◽

10.1063/1.371555 ◽

1999 ◽

Vol 86 (10) ◽

pp. 5524-5529 ◽

Author(s):

D. Gall ◽

I. Petrov ◽

P. Desjardins ◽

J. E. Greene

Keyword(s):

Microstructural Evolution ◽

Poisson Ratio ◽

Ultrahigh Vacuum ◽

Sputter Deposition ◽

Reactive Magnetron ◽

Magnetron Sputter Deposition ◽

Magnetron Sputter

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The sputter deposition of broadband transparent and highly conductive cerium and hydrogen co‐doped indium oxide and its transfer to silicon heterojunction solar cells

Progress in Photovoltaics Research and Applications ◽

10.1002/pip.3388 ◽

2021 ◽

Author(s):

Leonard Tutsch ◽

Hitoshi Sai ◽

Takuya Matsui ◽

Martin Bivour ◽

Martin Hermle ◽

...

Keyword(s):

Solar Cells ◽

Indium Oxide ◽

Sputter Deposition ◽

Heterojunction Solar Cells ◽

Co Doped ◽

Silicon Heterojunction Solar Cells

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Energetic particle fluxes in magnetron sputter deposition of a-Si:H

Journal of Non-Crystalline Solids ◽

10.1016/s0022-3093(05)80237-6 ◽

1991 ◽

Vol 137-138 ◽

pp. 783-786 ◽

Author(s):

Alan M. Myers ◽

James R. Doyle ◽

G. Jeff Feng ◽

Nagi Maley ◽

David L. Ruzic ◽

...

Keyword(s):

Energetic Particle ◽

Sputter Deposition ◽

Magnetron Sputter Deposition ◽

Magnetron Sputter ◽

Particle Fluxes

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Optical properties of intrinsic and doped a-Si:H films grown by d.c. magnetron sputter deposition

Thin Solid Films ◽

10.1016/s0040-6090(01)01179-8 ◽

2001 ◽

Vol 394 (1-2) ◽

pp. 255-262 ◽

Author(s):

A Rantzer

Keyword(s):

Optical Properties ◽

Sputter Deposition ◽

Magnetron Sputter Deposition ◽

Magnetron Sputter

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Effect of the nature of the working gas on the d.c. magnetron sputter deposition of chromium nitride and oxi-nitride thin films on steel substrates

Surface and Coatings Technology ◽

10.1016/0257-8972(95)02709-2 ◽

1996 ◽

Vol 80 (1-2) ◽

pp. 190-194 ◽

Author(s):

J. Baborowski ◽

M. Charbonnier ◽

M. Romand

Keyword(s):

Sputter Deposition ◽

Chromium Nitride ◽

Magnetron Sputter Deposition ◽

Magnetron Sputter ◽

Steel Substrates

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Properties of Al Films Depend on Substrate Temperature by DC Magnetron Sputter Deposition

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.662.413 ◽

2013 ◽

Vol 662 ◽

pp. 413-416

Author(s):

Yi Shen ◽

Ruo He Yao

Keyword(s):

Film Thickness ◽

Substrate Temperature ◽

Sheet Resistance ◽

Cross Section ◽

Sputter Deposition ◽

Surface Profiling ◽

Magnetron Sputter Deposition ◽

Magnetron Sputter ◽

Substrate Temperatures

Al films were prepared by DC magnetron sputter deposition at different substrate temperatures. The sheet resistance of the films was measured by four point probe sheet resistance meter, and the film thickness, which was obtained by surface profiling system. The surface and cross-section morphology of the films was observed by AFM and FESEM. As a result, the resistivity of the films decreases obviously as the substrate temperature increases gradually. The higher substrate temperature is, the rougher the films surface is and the larger the grain size is.

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Magnetron sputter deposition of hafnium nitride coating on high density graphite and niobium substrates

Ceramics International ◽

10.1016/j.ceramint.2012.12.014 ◽

2013 ◽

Vol 39 (5) ◽

pp. 5175-5184 ◽

Author(s):

A. Ravi Shankar ◽

U. Kamachi Mudali ◽

Vipin Chawla ◽

Ramesh Chandra

Keyword(s):

Sputter Deposition ◽

High Density ◽

Nitride Coating ◽

Hafnium Nitride ◽

Density Graphite ◽

Magnetron Sputter Deposition ◽

Magnetron Sputter

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Exceptions to the microstructure zone model revealed by the reactive d.c. magnetron sputter deposition of δ-TiNx thin films

Surface and Coatings Technology ◽

10.1016/0257-8972(93)90136-c ◽

1993 ◽

Vol 60 (1-3) ◽

pp. 480-483 ◽

Author(s):

V. Poulek ◽

C. Quaeyhaegens ◽

G. Knuyt ◽

L. Stals ◽

V. Fagard

Keyword(s):

Sputter Deposition ◽

Magnetron Sputter Deposition ◽

Magnetron Sputter

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Controlling the deposition rate during target erosion in reactive pulsed DC magnetron sputter deposition of alumina

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2012.05.070 ◽

2012 ◽

Vol 206 (23) ◽

pp. 4850-4854 ◽

Author(s):

N.D. Madsen ◽

B.H. Christensen ◽

S. Louring ◽

A.N. Berthelsen ◽

K.P. Almtoft ◽

...

Keyword(s):

Deposition Rate ◽

Sputter Deposition ◽

Pulsed Dc ◽

Magnetron Sputter Deposition ◽

Magnetron Sputter

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