Internal Photoemission at Interaces of ALD TaiOxInsulating Layers Deposited on Si, InP and In0.53Ga0.47As
2012 ◽
Vol 41
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pp. 012019
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2005 ◽
Vol 46
(6)
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pp. 473-481
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Keyword(s):
1980 ◽
Vol 21
(3)
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pp. 219-226
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2016 ◽
Vol 55
(4S)
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pp. 04EG05
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Keyword(s):