scholarly journals Band gap measurements of monolayer h-BN and insights into carbon-related point defects

2D Materials ◽  
2021 ◽  
Author(s):  
Ricardo Javier Peña Román ◽  
Fábio J. R. Costa ◽  
Alberto Zobelli ◽  
Christine Elias ◽  
Pierre Valvin ◽  
...  
Keyword(s):  
Band Gap ◽  
2022 ◽  
pp. 152461
Author(s):  
Shengsheng Wei ◽  
Zhipeng Yin ◽  
Jiao Bai ◽  
Weiwei Xie ◽  
Fuwen Qin ◽  
...  

2020 ◽  
Vol 34 (17) ◽  
pp. 2050147
Author(s):  
Yuqin Guan ◽  
Qingyu Hou ◽  
Danyang Xia

The effect of intrinsic point defects on the electronic structure and absorption spectra of ZnO was investigated by first-principle calculation. Among the intrinsic point defects in ZnO, oxygen vacancies [Formula: see text] and interstitial zinc [Formula: see text] have the lower formation energy and the more stable structure under zinc(Zn)-rich condition, whereas zinc vacancies [Formula: see text] and interstitial oxygen [Formula: see text] have the lower formation energy and the more stable structure under oxygen(O)-rich condition. The band gap of [Formula: see text] becomes narrow and the absorption spectrum has a redshift. In the visible region, the photo-excited electron transition of [Formula: see text] is graded from the valence band top to the impurity level and then to the conduction band bottom, showing the redshift of absorption spectrum of [Formula: see text] and explaining the reason of [Formula: see text] forming a deep impurity levels in ZnO. Moreover, the impurity energy level of [Formula: see text] coincides with the Fermi level, indicating the significant trap effect and the slow recombination of electrons and holes, which are conducive to the design and preparation of novel ZnO photocatalysts. The band gap of [Formula: see text] and [Formula: see text] broadened and the absorption spectrum showed blueshift, explaining the different values of the ZnO band gap width.


2019 ◽  
Vol 21 (20) ◽  
pp. 10497-10504 ◽  
Author(s):  
Jun Chai ◽  
Chen Ming ◽  
Xiaolong Du ◽  
Pengfei Qiu ◽  
Yi-Yang Sun ◽  
...  

β-FeSi2, a semiconductor material made of two of the most earth-abundant elements, has important applications in thermoelectrics, photovoltaics and optoelectronics owing to its attractive properties such as suitable band gap and air stability over a wide temperature range. In this paper, we present a systematic study on point defects in this material.


2017 ◽  
Vol 8 (1) ◽  
Author(s):  
Yu Kumagai ◽  
Kou Harada ◽  
Hirofumi Akamatsu ◽  
Kosuke Matsuzaki ◽  
Fumiyasu Oba

2016 ◽  
Vol 51 (22) ◽  
pp. 10245-10261 ◽  
Author(s):  
M. León ◽  
M. Lancry ◽  
N. Ollier ◽  
B. H. Babu ◽  
L. Bigot ◽  
...  

2019 ◽  
Vol 18 (1) ◽  
pp. 1013-1018 ◽  
Author(s):  
Vladimir Markevich ◽  
Anthony R. Peaker ◽  
Irina F. Medvedeva ◽  
Vasilii E. Gusakov ◽  
Leonid I. Murin ◽  
...  
Keyword(s):  

2012 ◽  
Vol 111 (2) ◽  
pp. 023515 ◽  
Author(s):  
Wei Dai ◽  
Hong Wang ◽  
Shibin Chen ◽  
Dichen Li ◽  
Di Zhou

2006 ◽  
Vol 251-252 ◽  
pp. 1-12 ◽  
Author(s):  
Faruque M. Hossain ◽  
Graeme E. Murch ◽  
L. Sheppard ◽  
Janusz Nowotny

The purpose of this work is to study the effect of bulk point defects on the electronic structure of rutile TiO2. The paper is focused on the effect of oxygen nonstoichiometry in the form of oxygen vacancies, Ti interstitials and Ti vacancies and related defect disorder on the band gap width and on the local energy levels inside the band gap. Ab initio density functional theory is used to calculate the formation energies of such intrinsic defects and to detect the positions of these defect induced energy levels in order to visualize the tendency of forming local mid-gap bands. Apart from the formation energy of the Ti vacancies (where experimental data do not exist) our calculated results of the defect formation energies are in fair agreement with the experimental results and the defect energy levels consistently support the experimental observations. The calculated results indicate that the exact position of defect energy levels depends on the estimated band gap and also the charge state of the point defects of TiO2.


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