Theory of the Cathode Sheath in a Low-Density Gas Discharge

1958 ◽  
Vol 111 (4) ◽  
pp. 1017-1028 ◽  
Author(s):  
P. L. Auer ◽  
H. Hurwitz ◽  
S. Tamor
Keyword(s):  
Gas Discharge ◽  
Low Density ◽  
Cathode Sheath

scholarly journals Monitoring Removal of W Layer from Ag Substrate Using Balmer-α Emission of Backscattered Hydrogen Atoms in Low Density Gas Discharge

2020 ◽  
Vol 138 (4) ◽  
pp. 643-649
Author(s):  
S. Ertmer ◽  
O. Marchuk ◽  
S. Dickheuer ◽  
S. Heuer ◽  
P.H. Mertens ◽  
...  
Keyword(s):  
Gas Discharge ◽  
Low Density ◽  
Hydrogen Atoms ◽  
Ag Substrate

Controlling the breakdown delay time in pulsed gas discharge

2021 ◽  
Author(s):  
Irina V Schweigert ◽  
Matthew Hopkins ◽  
Ed V Barnat ◽  
Michael Keidar
Keyword(s):  
Delay Time ◽  
Time Delays ◽  
Pulse Discharge ◽  
Gas Discharge ◽  
Pulsed Discharge ◽  
Cathode Sheath ◽  
Stochastic Nature ◽  
Breakdown Process ◽  
Pulsed Gas Discharge ◽  
Three Stages

Abstract In experiment and 2D3V PIC MCC simulations, the breakdown development in a pulsed discharge in helium is studied for U=3.2 kV and 10 kV and P=100 Torr. The breakdown process is found to have a stochastic nature, and the electron avalanche develops in different experimental and simulation runs with time delays ranging from 0.3 to 8 μs. Nevertheless our experiments demonstrate that the breakdown delay time distribution can be controlled with a change of the pulse discharge frequency. The simulation results show that the breakdown process can be distinguished in three stages with a) the ionization by seed electrons, b) the ions drift to the cathode and c) the enhanced ionization within the cathode sheath by the electrons emitted from the cathode. The effects of variation of seed electron concentrations, voltage rise times, voltage amplitudes and ion-electron emission coefficients on the breakdown development in the pulsed gas discharge are reported.

Kinetic model for low-density non-stationary gas discharge in water vapour

2010 ◽  
Vol 43 (31) ◽  
pp. 315201 ◽  
Author(s):  
S V Avtaeva ◽  
A A General ◽  
V A Kel'man
Keyword(s):  
Kinetic Model ◽  
Water Vapour ◽  
Gas Discharge ◽  
Low Density

A contribution to spectroscopic diagnostics and cathode sheath modeling of micro-hollow gas discharge in argon

2011 ◽  
Vol 110 (3) ◽  
pp. 033305 ◽  
Author(s):  
M. Cvejić ◽  
Dj. Spasojević ◽  
N. M. Šišović ◽  
N. Konjević
Keyword(s):  
Gas Discharge ◽  
Cathode Sheath ◽  
Spectroscopic Diagnostics

Application of Improved Voltage Compensation in the SEM to Imaging of Organic Materials

1973 ◽  
Vol 31 ◽  
pp. 444-445
Author(s):  
P.J. Killingworth ◽  
M. Warren
Keyword(s):  
Electron Beam ◽  
Organic Materials ◽  
Operating Parameters ◽  
Low Density ◽  
Beam Diameter ◽  
Incident Electron Beam ◽  
Specimen Material ◽  
Voltage Compensation ◽  
Selection Of ◽  
Scanning Electron

Ultimate resolution in the scanning electron microscope is determined not only by the diameter of the incident electron beam, but by interaction of that beam with the specimen material. Generally, while minimum beam diameter diminishes with increasing voltage, due to the reduced effect of aberration component and magnetic interference, the excited volume within the sample increases with electron energy. Thus, for any given material and imaging signal, there is an optimum volt age to achieve best resolution.In the case of organic materials, which are in general of low density and electric ally non-conducting; and may in addition be susceptible to radiation and heat damage, the selection of correct operating parameters is extremely critical and is achiev ed by interative adjustment.

Quantitative defect studies in semiconductor TEM samples prepared by low angle ion milling

1995 ◽  
Vol 53 ◽  
pp. 512-513
Author(s):  
L. Mulestagno ◽  
J.C. Holzer ◽  
P. Fraundorf
Keyword(s):  
Sample Preparation ◽  
Milling Time ◽  
High Density ◽  
Low Density ◽  
Ion Milling ◽  
High Quality ◽  
Variable Angle ◽  
Major Disadvantage ◽  
Induced Defects

Due to the wealth of information, both analytical and structural that can be obtained from it TEM always has been a favorite tool for the analysis of process-induced defects in semiconductor wafers. The only major disadvantage has always been, that the volume under study in the TEM is relatively small, making it difficult to locate low density defects, and sample preparation is a somewhat lengthy procedure. This problem has been somewhat alleviated by the availability of efficient low angle milling.Using a PIPS® variable angle ion -mill, manufactured by Gatan, we have been consistently obtaining planar specimens with a high quality thin area in excess of 5 × 104 μm2 in about half an hour (milling time), which has made it possible to locate defects at lower densities, or, for defects of relatively high density, obtain information which is statistically more significant (table 1).

Intralysosomal Accumulation of Colloidal Gold-Low Density Lipoprotein Conjugates in Chloroquine-Treated Fibroblasts

1985 ◽  
Vol 43 ◽  
pp. 546-547 ◽  
Author(s):  
Dean A. Handley ◽  
Cynthia M. Arbeeny ◽  
Larry D. Witte
Keyword(s):  
Colloidal Gold ◽  
Cultured Cells ◽  
Low Density Lipoprotein ◽  
Density Lipoprotein ◽  
Coated Vesicle ◽  
Low Density ◽  
Cholesterol Esters ◽  
Cultured Fibroblasts ◽  
Surface Receptors ◽  
Ldl Particles

Low density lipoproteins (LDL) are the major cholesterol carrying particles in the blood. Using cultured cells, it has been shown that LDL particles interact with specific surface receptors and are internalized via a coated pit-coated vesicle pathway for lysosomal catabolism. This (Pathway has been visualized using LDL labeled to ferritin or colloidal gold. It is now recognized that certain lysomotropic agents, such as chloroquine, inhibit lysosomal enzymes that degrade protein and cholesterol esters. By interrupting cholesterol ester hydrolysis, chloroquine treatment results in lysosomal accumulation of cholesterol esters from internalized LDL. Using LDL conjugated to colloidal gold, we have examined the ultrastructural effects of chloroquine on lipoprotein uptake by normal cultured fibroblasts.

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