scholarly journals Direct Measurement of Electron Intervalley Relaxation in a Si/Si - Ge Quantum Dot

2020 ◽  
Vol 14 (5) ◽  
Author(s):  
Nicholas E. Penthorn ◽  
Joshua S. Schoenfield ◽  
Lisa F. Edge ◽  
HongWen Jiang
2008 ◽  
Vol 1108 ◽  
Author(s):  
Faquir C. Jain ◽  
Mukesh Gogna ◽  
Fuad Alamoody ◽  
Supriya Karmakar ◽  
Ernesto Suarez ◽  
...  

AbstractThis paper presents electrical transfer (Id-Vg) and output (Id-Vds) characteristics of a GeOx-cladded-Ge quantum dot (QD) gate Si MOSFET devices. In QD gate FETs, the manifestation of an intermediate state ‘i” makes it a 3-state device. The intermediate state originates due to compensation of increment in the gate voltage by a similar increase in the threshold voltage, which occurs via charge neutralization in the QD gate due to transfer of charge from the inversion layer to either first or second of the two QD layers.


Nano Futures ◽  
2020 ◽  
Vol 4 (1) ◽  
pp. 015001
Author(s):  
Yu-Hong Kuo ◽  
Shih-Hsuan Chiu ◽  
Che-Wei Tien ◽  
Sheng-Di Lin ◽  
Wen-Hao Chang ◽  
...  

2005 ◽  
Vol 44 (No. 33) ◽  
pp. L1045-L1047
Author(s):  
Chie-In Lee ◽  
Yan-Ten Lu ◽  
Yan-Kuin Su ◽  
Shoou-Jinn Chang ◽  
Jenn-Shyong Hwang ◽  
...  

2003 ◽  
Vol 20 (11) ◽  
pp. 2001-2003 ◽  
Author(s):  
Yang Zheng ◽  
Shi Yi ◽  
Liu Jian-Lin ◽  
Yan Bo ◽  
Huang Zhuang-Xiong ◽  
...  

2018 ◽  
Vol 29 (27) ◽  
pp. 275601 ◽  
Author(s):  
J Tempeler ◽  
S Danylyuk ◽  
S Brose ◽  
P Loosen ◽  
L Juschkin

2011 ◽  
Vol 22 (15) ◽  
pp. 155701 ◽  
Author(s):  
J B Haskins ◽  
A Kinaci ◽  
T Çağin

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