Langmuir probe measurements in an inductively coupled plasma source

Physical Review E ◽

10.1103/physreve.55.3450 ◽

1997 ◽

Vol 55 (3) ◽

pp. 3450-3459 ◽

Author(s):

A. Schwabedissen ◽

E. C. Benck ◽

J. R. Roberts

Keyword(s):

Langmuir Probe ◽

Inductively Coupled Plasma ◽

Plasma Source ◽

Inductively Coupled ◽

Langmuir Probe Measurements ◽

Probe Measurements

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Langmuir probe measurements of the ion extraction process in inductively coupled plasma mass spectrometry-I. spatially resolved determination of electron density and electron temperature

Spectrochimica Acta Part B Atomic Spectroscopy ◽

10.1016/0584-8547(94)80109-6 ◽

1994 ◽

Vol 49 (12-14) ◽

pp. 1283-1303 ◽

Author(s):

Hongsen Niu ◽

R.S. Houk

Keyword(s):

Langmuir Probe ◽

Inductively Coupled Plasma ◽

Extraction Process ◽

Inductively Coupled ◽

Ion Extraction ◽

Spatially Resolved ◽

Plasma Mass Spectrometry ◽

Langmuir Probe Measurements ◽

Probe Measurements

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Langmuir probe measurements in a low pressure inductively coupled plasma used for diamond deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581691 ◽

1999 ◽

Vol 17 (3) ◽

pp. 721-725 ◽

Author(s):

Katsuyuki Okada ◽

Shojiro Komatsu ◽

Seiichiro Matsumoto

Keyword(s):

Langmuir Probe ◽

Inductively Coupled Plasma ◽

Low Pressure ◽

Diamond Deposition ◽

Inductively Coupled ◽

Langmuir Probe Measurements ◽

Probe Measurements

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Langmuir probe measurements of electron temperature and electron density behind the skimmer of an inductively coupled plasma mass spectrometer

Spectrochimica Acta Part B Atomic Spectroscopy ◽

10.1016/0584-8547(91)80082-e ◽

1991 ◽

Vol 46 (6-7) ◽

pp. 805-817 ◽

Author(s):

H.S. Niu ◽

Ke Hu ◽

R.S. Houk

Keyword(s):

Electron Temperature ◽

Electron Density ◽

Mass Spectrometer ◽

Langmuir Probe ◽

Inductively Coupled Plasma ◽

Inductively Coupled ◽

Langmuir Probe Measurements ◽

Probe Measurements

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Langmuir probe measurements of electron temperature in an inductively coupled plasma

Spectrochimica Acta Part B Atomic Spectroscopy ◽

10.1016/0584-8547(88)80053-3 ◽

1988 ◽

Vol 43 (3) ◽

pp. 273-285 ◽

Author(s):

Lu Pei-Qi ◽

Gong Pei-Zhong ◽

Lin Tie-Zheng ◽

R.S. Houk

Keyword(s):

Electron Temperature ◽

Langmuir Probe ◽

Inductively Coupled Plasma ◽

Inductively Coupled ◽

Langmuir Probe Measurements ◽

Probe Measurements

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Langmuir probe measurements of potential inside a supersonic jet extracted from an inductively coupled plasma

Spectrochimica Acta Part B Atomic Spectroscopy ◽

10.1016/0584-8547(89)80099-0 ◽

1989 ◽

Vol 44 (10) ◽

pp. 989-998 ◽

Author(s):

H.B. Lim ◽

R.S. Houk ◽

Jeffrey S. Crain

Keyword(s):

Langmuir Probe ◽

Inductively Coupled Plasma ◽

Supersonic Jet ◽

Inductively Coupled ◽

Langmuir Probe Measurements ◽

Probe Measurements

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Langmuir probe measurements of the ion extraction process in inductively coupled plasma-mass spectrometry. Part 2. Measurements of floating voltage and radiofrequency voltage

Spectrochimica Acta Part B Atomic Spectroscopy ◽

10.1016/0584-8547(95)01331-8 ◽

1995 ◽

Vol 50 (10) ◽

pp. 1247-1261 ◽

Author(s):

Hongsen Niu ◽

Shen Luan ◽

Ho-Ming Pang ◽

R.S. Houk

Keyword(s):

Mass Spectrometry ◽

Langmuir Probe ◽

Inductively Coupled Plasma ◽

Extraction Process ◽

Inductively Coupled ◽

Ion Extraction ◽

Plasma Mass Spectrometry ◽

Langmuir Probe Measurements ◽

Probe Measurements

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Langmuir probe measurements in an inductively coupled plasma: Electron energy distribution functions in polymerizing fluorocarbon gases used for selective etching of SiO2

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1474419 ◽

2002 ◽

Vol 20 (3) ◽

pp. 919-927 ◽

Author(s):

Freddy Gaboriau ◽

Marie-Claude Peignon ◽

Gilles Cartry ◽

Laetitia Rolland ◽

David Eon ◽

...

Keyword(s):

Energy Distribution ◽

Electron Energy ◽

Langmuir Probe ◽

Inductively Coupled Plasma ◽

Plasma Electron ◽

Distribution Functions ◽

Inductively Coupled ◽

Langmuir Probe Measurements ◽

Energy Distribution Functions ◽

Probe Measurements

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A Langmuir probe system incorporating the Boyd–Twiddy method for EEDF measurement applied to an inductively coupled plasma source

Plasma Sources Science and Technology ◽

10.1088/0963-0252/18/1/014010 ◽

2008 ◽

Vol 18 (1) ◽

pp. 014010 ◽

Author(s):

B Crowley ◽

S Dietrich

Keyword(s):

Langmuir Probe ◽

Inductively Coupled Plasma ◽

Plasma Source ◽

Inductively Coupled ◽

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Mass spectrometric and Langmuir probe measurements in inductively coupled plasmas in Ar, CHF3/Ar and CHF3/Ar/O2mixtures

Plasma Sources Science and Technology ◽

10.1088/0963-0252/10/2/309 ◽

2001 ◽

Vol 10 (2) ◽

pp. 191-204 ◽

Author(s):

J S Kim ◽

M V V S Rao ◽

M A Cappelli ◽

S P Sharma ◽

M Meyyappan

Keyword(s):

Langmuir Probe ◽

Mass Spectrometric ◽

Inductively Coupled Plasmas ◽

Inductively Coupled ◽

Langmuir Probe Measurements ◽

Coupled Plasmas ◽

Probe Measurements

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Time resolved Langmuir probe measurements in inductively coupled plasmas

IEEE Conference Record - Abstracts 2002 IEEE International Conference on Plasma Science (Cat No 02CH37340) PLASMA-02 ◽

10.1109/plasma.2002.1030466 ◽

2003 ◽

Author(s):

G. Cartry ◽

D. Eon ◽

V. Raballand ◽

F. Gaboriau ◽

M.C. Peignon ◽

...

Keyword(s):

Langmuir Probe ◽

Inductively Coupled Plasmas ◽

Time Resolved ◽

Inductively Coupled ◽

Langmuir Probe Measurements ◽

Coupled Plasmas ◽

Probe Measurements

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