Diamond Deposition on Iron and Steel Substrates: A Review

This article presents an overview of the research in chemical vapor deposition (CVD) diamond films on steel substrates. Since the steels are the most commonly used and cost-effective structural materials in modern industry, CVD coating diamond films on steel substrates are extremely important, combining the unique surface properties of diamond with the superior toughness and strength of the core steel substrates, and will open up many new applications in the industry. However, CVD diamond deposition on steel substrates continues to be a persistent problem. We go through the most relevant results of the last two and a half decades, including recent advances in our group. This review discusses the essential reason of the thick catalytic graphite interlayer formed on steel substrates before diamond deposition. The high carbon diffusion in iron would induce severe internal carburization, and then voluminous graphite precipitated from the substrate. In order to hinder the catalytic graphite formation, various methods have been applied for the adherent diamond film deposition, such as pre-imposed various interlayers or multi-interlayers, special controls of the deposition process, the approaches of substrate alloying and so on. We found that adherent diamond films can be directly deposited on Al alloying steel substrates, and then the role of Al alloying element was examined. That is a thin dense amorphous alumina sublayer in situ formed on the alloying substrate, which played a critical role in preventing the formation of graphite phase and consequently enhancing diamond growth and adhesion. The mechanism of Al alloying suggests that the way used to improve hot corrosion resistance is also applicable. Then, some of the hot corrosion resistance methods, such as aluminizing, siliconizing, and so on, which have been used by some researchers examining CVD diamond films on steel substrates, are reviewed. Another way is to prepare diamond-like carbon (DLC) films on steel substrates at low temperature, and then the precipitated graphite from the internal carburization can be effectively avoided. In addition, based on some new findings, the understanding of the diamond nucleation and metastable growth is discussed.

Deposition of Boron-Doped Thin CVD Diamond Films from Methane-Triethyl Borate-Hydrogen Gas Mixture

Boron-doped diamond is a promising semiconductor material that can be used as a sensor and in power electronics. Currently, researchers have obtained thin boron-doped diamond layers due to low film growth rates (2–10 μm/h), with polycrystalline diamond growth on the front and edge planes of thicker crystals, inhomogeneous properties in the growing crystal’s volume, and the presence of different structural defects. One way to reduce structural imperfection is the specification of optimal synthesis conditions, as well as surface etching, to remove diamond polycrystals. Etching can be carried out using various gas compositions, but this operation is conducted with the interruption of the diamond deposition process; therefore, inhomogeneity in the diamond structure appears. The solution to this problem is etching in the process of diamond deposition. To realize this in the present work, we used triethyl borate as a boron-containing substance in the process of boron-doped diamond chemical vapor deposition. Due to the oxygen atoms in the triethyl borate molecule, it became possible to carry out an experiment on simultaneous boron-doped diamond deposition and growing surface etching without the requirement of process interruption for other operations. As a result of the experiments, we obtain highly boron-doped monocrystalline diamond layers with a thickness of about 8 μm and a boron content of 2.9%. Defects in the form of diamond polycrystals were not detected on the surface and around the periphery of the plate.