Design of RF Powered ZigBee Sensor Node and sub 1GHz RF Power Transmitter for Asset Tracking

Author(s):  
S. Mohamed Rabeek ◽  
Salahuddin Raju ◽  
M. Kumarasamy Raja
Keyword(s):  
Rf Power ◽  
Author(s):  
S.K. Streiffer ◽  
C.B. Eom ◽  
J.C. Bravman ◽  
T.H. Geballet

The study of very thin (<15 nm) YBa2Cu3O7−δ (YBCO) films is necessary both for investigating the nucleation and growth of films of this material and for achieving a better understanding of multilayer structures incorporating such thin YBCO regions. We have used transmission electron microscopy to examine ultra-thin films grown on MgO substrates by single-target, off-axis magnetron sputtering; details of the deposition process have been reported elsewhere. Briefly, polished MgO substrates were attached to a block placed at 90° to the sputtering target and heated to 650 °C. The sputtering was performed in 10 mtorr oxygen and 40 mtorr argon with an rf power of 125 watts. After deposition, the chamber was vented to 500 torr oxygen and allowed to cool to room temperature. Because of YBCO’s susceptibility to environmental degradation and oxygen loss, the technique of Xi, et al. was followed and a protective overlayer of amorphous YBCO was deposited on the just-grown films.


Author(s):  
T. A. Emma ◽  
M. P. Singh

Optical quality zinc oxide films have been characterized using reflection electron diffraction (RED), replication electron microscopy (REM), scanning electron microscopy (SEM), and X-ray diffraction (XRD). Significant microstructural differences were observed between rf sputtered films and planar magnetron rf sputtered films. Piezoelectric materials have been attractive for applications to integrated optics since they provide an active medium for signal processing. Among the desirable physical characteristics of sputtered ZnO films used for this and related applications are a highly preferred crystallographic texture and relatively smooth surfaces. It has been found that these characteristics are very sensitive to the type and condition of the substrate and to the several sputtering parameters: target, rf power, gas composition and substrate temperature.


2013 ◽  
Vol 133 (4) ◽  
pp. 414-420 ◽  
Author(s):  
Tsuyoshi Suzuki ◽  
Takafumi Kobayashi ◽  
Kei Sawai ◽  
Kuniaki Kawabata ◽  
Fumiaki Takemura ◽  
...  

2002 ◽  
Author(s):  
Douglas R. Smith ◽  
Stephen Fitzpatrick ◽  
Stephen J. Westfold

Sign in / Sign up

Export Citation Format

Share Document