Production of Two-Dimensional Porous TiNi-Based Powder Material by Diffusion Sintering and Electron-Beam Processing

2020 ◽  
Author(s):  
Sergey Anikeev ◽  
Evgeniy Yakovlev ◽  
Nadezhda Artyukhova ◽  
Oibek Mamazakirov ◽  
Maria Kaftaranova ◽  
...  
Keyword(s):  
Electron Beam ◽  
Powder Material ◽  
Two Dimensional ◽  
Electron Beam Processing ◽  
Diffusion Sintering

scholarly journals Preserving quality of fresh cut watermelon cubes for vending distribution by low-dose electron beam processing

Food Control ◽  
2017 ◽  
Vol 72 ◽  
pp. 367-371 ◽  
Author(s):  
Bianca Smith ◽  
Adrienne Ortega ◽  
Shima Shayanfar ◽  
Suresh D. Pillai
Keyword(s):  
Electron Beam ◽  
Low Dose ◽  
Electron Beam Processing ◽  
Fresh Cut

Factors Influencing SO2 Removal Efficiency by Electron Beam Processing of Coal-Fired Flue Gas Treatment

1998 ◽  
Vol 9 (5) ◽  
pp. 535-547 ◽  
Author(s):  
Ryunosuke Kikuchi
Keyword(s):  
Electron Beam ◽  
Flue Gas ◽  
Electron Beam Irradiation ◽  
Gas Treatment ◽  
So2 Removal ◽  
Electron Beam Processing ◽  
Scale Test ◽  
Sulphate Salts ◽  
Flue Gas Treatment ◽  
Bench Scale Test

A bench-scale test (800 Nm3/h) for electron beam treatment of flue gas was conducted. It was concluded that the method is favourable for treatment of flue gas with a high SO2 concentration (5,500 ppm) at low electron beam irradiation (5 kGy). Results are consistent with the claim that SOx is removed from flue gas by the reaction of SOx with ammonia, and the intermediate salts formed are oxidised by radicals to sulphate salts consisting mainly of ammonium sulphate (a N-fertiliser). A typical flue gas desulphurization (FGD) method such as the wet limestone process cannot remove NOx and SO3 effectively (Ando, 1990), but the electron beam process removes SO2, SO3 and NOx simultaneously without generating waste water and CO2.

Electron Beam Processing of Rubber

2008 ◽  
Author(s):  
Papiya Sen Majumder ◽  
Anil Bhowmick ◽  
Indranil Banik ◽  
Rajatendu Sengupta ◽  
V Vijayabaskar
Keyword(s):  
Electron Beam ◽  
Electron Beam Processing

Effect of electron-beam processing on structure of electroexplosive electroerosion resistant coatings of CuO-Ag system

2019 ◽  
Vol 6 (8) ◽  
pp. 085077 ◽  
Author(s):  
D A Romanov ◽  
S V Moskovskii ◽  
K V Sosnin ◽  
V E Gromov ◽  
Yu F Ivanov ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Processing

scholarly journals Nonlinear processes in the bunched electron beams of high-power klystrons and the limits of analytical and one-dimensional numerical models applicability for their analysis.

2020 ◽  
Vol 2020 (12) ◽  
Author(s):  
V.Y. Rodyakin ◽  
◽  
V.M. Pikunov ◽  
V.N. Aksenov ◽  
◽  
...  
Keyword(s):  
Electron Beam ◽  
High Power ◽  
Numerical Models ◽  
Nonlinear Effects ◽  
Analytical Models ◽  
Modulation Amplitude ◽  
Two Dimensional ◽  
One Dimensional ◽  
Charge Parameter ◽  
Program Data

We present the results of a comparative theoretical analysis of the electron beam bunching in a single-stage klystron amplifier using analytical models, a one-dimensional disk program, and a two-dimensional program. Data on the influence of various one-dimensional and two-dimensional nonlinear effects on the efficiency of electron beam bunching at different values of the space charge parameter and the modulation amplitude are presented. The limits of applicability of analytical and one-dimensional numerical models for electron beam bunching analysis in high-power klystron amplifiers are found.

Formation Of Two-Dimensional Photonic Crystals With Cavities Arrays In Silicon

2016 ◽  
Vol 11 (1) ◽  
pp. 88-93
Author(s):  
Dmitriy Utkin ◽  
Aleksandr Shklyaev ◽  
Fedor Dultsev ◽  
Aleksandr Latyshev
Keyword(s):  
Electron Beam ◽  
Photonic Crystals ◽  
Electron Beam Lithography ◽  
Spatial Distributions ◽  
Two Dimensional ◽  
Interference Effects ◽  
Technological Parameters ◽  
Beam Interaction ◽  
Cavity Array ◽  
Better Than

Specific aspects of finely focused electron beam interaction with the PMMA-950K resist for the fabrication of closely spaced holes having inhomogeneous spatial distributions are studied. The technological parameters for the creation of two-dimensional photonic crystals with microcavities (missing holes) arrays, which allow obtaining the lateral sizes of the structure within the accuracy better than 2 %, in silicon using electron-beam lithography are determined. Such holes fabrication accuracy is thought to be sufficient to study the interference effects of cavity array radiation in twodimensional photonic crystals.

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