New Technologies for Improving the High Frequency Performance of AlGaN/GaN High Electron Mobility Transistors

Author(s):  
J. W. Chung ◽  
E. L. Piner ◽  
J. C. Roberts ◽  
T. Palacios
Micromachines ◽  
2020 ◽  
Vol 12 (1) ◽  
pp. 7
Author(s):  
Yu-Shyan Lin ◽  
Shin-Fu Lin

This study proposes AlGaN/GaN/silicon high-electron mobility transistors (HEMTs) grown by a metallorganic chemical vapor deposition (MOCVD) system. The large-signal linearity and high-frequency noise of HEMTs without and with different passivation layers are compared. The experimental data show that the addition of a TiO2 passivation layer to undoped AlGaN/GaN HEMT’s increases the value of the third-order intercept point (OIP3) by up to 70% at 2.4 GHz. Furthermore, the minimum noise figure (NFmin) of the HEMT with TiO2 passivation is significantly reduced.


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