Analysis of high efficiency amorphous silicon single and multijunction solar cells

Author(s):  
M Ikbal Kabir ◽  
Norhayati Mohd Zainee ◽  
Nowshad Amin
1985 ◽  
Vol 49 ◽  
Author(s):  
Stanford R. Ovshinsky ◽  
David Adler

AbstractThe desired properties of solar cells are discussed, and a relative figure of merit for the comparison of cells fabricated using different technologies is described. The advantages of utilizing amorphous silicon alloys as the active material in solar cells are enumerated. Selected materials properties of these alloys are described and the physics of their electronic structure is discussed in detail. The necessary steps for achieving commercially viable cells based on amorphous silicon alloys are listed, and it is demonstrated how each of them has been achieved using a technology that incorporates fluorine throughout the entire process. The chemical and physical basis for the superiority of fluorinated material is presented in detail. Continuous web large-area high-efficiency multijunction solar cells are in production. Dual band gap multijunction cells have been tested under continuous air mass 1 exposure for over 2000 hours and show essentially no degradation. Some recent results are presented.


2006 ◽  
Vol 910 ◽  
Author(s):  
Qi Wang ◽  
Matt P. Page ◽  
Eugene Iwancizko ◽  
Yueqin Xu ◽  
Yanfa Yan ◽  
...  

AbstractWe have achieved an independently-confirmed 17.8% conversion efficiency in a 1-cm2, p-type, float-zone silicon (FZ-Si) based heterojunction solar cell. Both the front emitter and back contact are hydrogenated amorphous silicon (a-Si:H) deposited by hot-wire chemical vapor deposition (HWCVD). This is the highest reported efficiency for a HWCVD silicon heterojunction (SHJ) solar cell. Two main improvements lead to our most recent increases in efficiency: 1) the use of textured Si wafers, and 2) the application of a-Si:H heterojunctions on both sides of the cell. Despite the use of textured c-Si to increase the short-circuit current, we were able to maintain the same 0.65 V open-circuit voltage as on flat c-Si. This is achieved by coating a-Si:H conformally on the c-Si surfaces, including covering the tips of the anisotropically-etched pyramids. A brief atomic H treatment before emitter deposition is not necessary on the textured wafers, though it was helpful in the flat wafers. It is essential to high efficiency SHJ solar cells that the emitter grows abruptly as amorphous silicon, instead of as microcrystalline or epitaxial Si. The contact on each side of the cell comprises a thin (< 5 nm) low substrate temperature (~100°C) intrinsic a-Si:H layer, followed by a doped layer. Our intrinsic layers are deposited at 0.3-1.2 nm/s. The doped emitter and back-contact layers were deposited at a higher temperature (>200°C) and grown from PH3/SiH4/H2 and B2H6/SiH4/H2 doping gas mixtures, respectively. This combination of low (intrinsic) and high (doped layer) growth temperatures was optimized by lifetime and surface recombination velocity measurements. Our rapid efficiency advance suggests that HWCVD may have advantages over plasma-enhanced (PE) CVD in fabrication of high-efficiency heterojunction c-Si cells; there is no need for process optimization to avoid plasma damage to the delicate, high-quality, Si wafers.


2018 ◽  
Vol 8 (1) ◽  
Author(s):  
Jinjoo Park ◽  
Vinh Ai Dao ◽  
Sangho Kim ◽  
Duy Phong Pham ◽  
Sunbo Kim ◽  
...  

1991 ◽  
Vol 30 (Part 1, No. 8) ◽  
pp. 1635-1640 ◽  
Author(s):  
Katsuhiko Higuchi ◽  
Katsuya Tabuchi ◽  
Koeng Su Lim ◽  
Makoto Konagai ◽  
Kiyoshi Takahashi

2019 ◽  
Vol 27 (12) ◽  
pp. 1104-1114 ◽  
Author(s):  
HyunJung Park ◽  
Youngseok Lee ◽  
Se Jin Park ◽  
Soohyun Bae ◽  
Sangho Kim ◽  
...  

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