Molecular beam epitaxy of low-resistance polycrystalline p-type GaSb

Author(s):  
Yingda Dong ◽  
D.W. Scott ◽  
Yun Wei ◽  
A.C. Gossard ◽  
M.J. Rodwell
1989 ◽  
Vol 67 (4) ◽  
pp. 326-329 ◽  
Author(s):  
G. H. McKinnon ◽  
J. N. McMullin ◽  
D. Landheer ◽  
M. Buchanan ◽  
P. Janega ◽  
...  

Results are presented that show that selective n- and p-type contacts with low resistance have been formed on silicon-doping superlattices. The superlattices were grown by molecular-beam epitaxy through a silicon mask to create built-in blocking regions at the edges of the mesas. Contacts of Mg2Si for the n-side and PtSi for the p-side were formed along the edges of the mesa, resulting in a successful diode-like behavior. A surface etch to remove doping impurities from the region surrounding the superlattice mesa was required to maintain contact–substrate isolation.


2003 ◽  
Vol 256 (3-4) ◽  
pp. 223-229 ◽  
Author(s):  
Yingda Dong ◽  
Dennis W. Scott ◽  
Yun Wei ◽  
Arthur C. Gossard ◽  
Mark J. Rodwell

2014 ◽  
Vol 11 (7-8) ◽  
pp. 1282-1285 ◽  
Author(s):  
Kunio Ichino ◽  
Takahiro Kojima ◽  
Shunsuke Obata ◽  
Takuma Kuroyanagi ◽  
Kenta Kimata ◽  
...  

2007 ◽  
Vol 244 (12) ◽  
pp. 4692-4692
Author(s):  
A. Armstrong ◽  
A. Corrion ◽  
C. Poblenz ◽  
U. K. Mishra ◽  
J. S. Speck ◽  
...  

1990 ◽  
Vol 57 (21) ◽  
pp. 2256-2258 ◽  
Author(s):  
T. M. Rossi ◽  
D. A. Collins ◽  
D. H. Chow ◽  
T. C. McGill

1995 ◽  
Vol 150 ◽  
pp. 221-226
Author(s):  
T. Tomioka ◽  
N. Okamoto ◽  
H. Ando ◽  
S. Yamaura ◽  
T. Fujii

2005 ◽  
Vol 44 (No. 17) ◽  
pp. L508-L510 ◽  
Author(s):  
Tomoki Abe ◽  
Koshi Ando ◽  
Katsushi Ikumi ◽  
Hiroyasu Maeta ◽  
Junji Naruse ◽  
...  

1998 ◽  
Vol 84 (11) ◽  
pp. 6100-6104 ◽  
Author(s):  
J. Hirose ◽  
K. Uesugi ◽  
M. Hoshiyama ◽  
T. Numai ◽  
I. Suemune ◽  
...  

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