Development of the post-chemical mechanical polishing cleaner suppressing galvanic corrosion between copper and the Co barrier metal

Author(s):  
Tomohiro Kusano ◽  
Toshiaki Shibata ◽  
Atsushi Itou ◽  
Fumikazu Mizutani
2000 ◽  
Vol 39 (Part 1, No. 11) ◽  
pp. 6216-6222 ◽  
Author(s):  
Seiichi Kondo ◽  
Noriyuki Sakuma ◽  
Yoshio Homma ◽  
Naofumi Ohashi

2015 ◽  
Vol 64 (40) ◽  
pp. 85-90 ◽  
Author(s):  
H. Kim ◽  
K. Seo ◽  
J. Moon ◽  
H. Kim ◽  
H. Hwang

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