Galvanic Corrosion Control during Cu Chemical Mechanical Polishing of Cu Interconnects that Contain Ruthenium Barrier Metal Film

2008 ◽  
Author(s):  
K. Maruyama ◽  
M. Shiohara ◽  
K. Yamada ◽  
S. Kondo ◽  
S. Saito
Keyword(s):  
Chemical Mechanical Polishing ◽  
Metal Film ◽  
Galvanic Corrosion ◽  
Mechanical Polishing ◽  
Corrosion Control ◽  
Cu Interconnects ◽  
Barrier Metal

Damageless Cu chemical mechanical polishing for porous SiOC/Cu interconnects

2007 ◽  
Vol 84 (11) ◽  
pp. 2615-2619 ◽  
Author(s):  
Seiichi Kondo ◽  
Kouichi Fukaya ◽  
Kouji Yamada ◽  
Tadakazu Miyazaki ◽  
Masahisa Fujita ◽  
...  
Keyword(s):  
Chemical Mechanical Polishing ◽  
Mechanical Polishing ◽  
Cu Interconnects

Slurry Chemical Corrosion and Galvanic Corrosion during Copper Chemical Mechanical Polishing

2000 ◽  
Vol 39 (Part 1, No. 11) ◽  
pp. 6216-6222 ◽  
Author(s):  
Seiichi Kondo ◽  
Noriyuki Sakuma ◽  
Yoshio Homma ◽  
Naofumi Ohashi
Keyword(s):  
Chemical Mechanical Polishing ◽  
Galvanic Corrosion ◽  
Mechanical Polishing ◽  
Chemical Corrosion

Barrier Metal Slurry for Low Defect Copper Damascene Chemical Mechanical Polishing

2015 ◽  
Vol 64 (40) ◽  
pp. 85-90 ◽  
Author(s):  
H. Kim ◽  
K. Seo ◽  
J. Moon ◽  
H. Kim ◽  
H. Hwang
Keyword(s):  
Chemical Mechanical Polishing ◽  
Mechanical Polishing ◽  
Barrier Metal
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