Bias and temperature dependence of hot carrier lifetime from 77 K to 300 K

Author(s):  
Song ◽  
MacWilliams ◽  
Cable ◽  
Woo
1993 ◽  
Author(s):  
Eric S. Snyder ◽  
Ashish Kapoor ◽  
Clint Anderson
Keyword(s):  

2019 ◽  
Vol 44 (1) ◽  
pp. 135-139 ◽  
Author(s):  
Junhong Feng ◽  
Zhenghao Gan ◽  
Lifei Zhang ◽  
Lifu Chang ◽  
Zicheng Pan ◽  
...  
Keyword(s):  

2010 ◽  
Vol 645-648 ◽  
pp. 327-330 ◽  
Author(s):  
Jawad ul Hassan ◽  
Peder Bergman

An extended structural defects which locally drastically reduces the carrier lifetime, has been observed in as-grown epilayers. A combination of back polishing, etching in molten KOH and optical microscopy revealed the geometrical structure of the stacking fault inside the epilayer. The fault started close to the epi-substrate interface, expanded initially rapidly but changed geometry after some time and reduced in size during further growth. The optical spectrum as well as the temperature dependence from this fault is identical to the emission from the single Shockley stacking faults previously only observed and formed in the bipolar diodes during forward voltage operation.


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