time dependent dielectric breakdown
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Author(s):  
Andrey Orlov ◽  
Ekaterina Ganykina ◽  
Askar Rezvanov

In this work, simulation modeling of processes of the diffusion of copper ions in low-k dielectric between two neighboring copper lines is performed


2021 ◽  
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2021 ◽  
Vol 68 (5) ◽  
pp. 2220-2225
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