Effect of ${\hbox{SiO}}_{2}$ and/or ${\hbox{SiN}}_{x}$ Passivation Layer on Thermal Stability of Self-Aligned Coplanar Amorphous Indium–Gallium–Zinc–Oxide Thin-Film Transistors
2013 ◽
Vol 9
(9)
◽
pp. 699-703
◽
2017 ◽
Vol 9
(15)
◽
pp. 13278-13285
◽
2009 ◽
Vol 12
(9)
◽
pp. H348
◽
Keyword(s):
2010 ◽
Keyword(s):
2015 ◽
Vol 135
(6)
◽
pp. 192-198
◽
Keyword(s):
Keyword(s):
Keyword(s):
2011 ◽
Vol 50
(3)
◽
pp. 03CB06
◽
Keyword(s):