GaN Avalanche Photodectors: A Full Band Monte Carlo Study of Gain, Noise and Bandwidth

2011 ◽  
Vol 47 (4) ◽  
pp. 447-454 ◽  
Author(s):  
Michele Moresco ◽  
Francesco Bertazzi ◽  
Enrico Bellotti
2003 ◽  
Vol 93 (6) ◽  
pp. 3389-3394 ◽  
Author(s):  
H.-E. Nilsson ◽  
U. Englund ◽  
M. Hjelm ◽  
E. Bellotti ◽  
K. Brennan

2001 ◽  
Vol 184 (1-4) ◽  
pp. 194-198 ◽  
Author(s):  
Mats Hjelm ◽  
Kent Bertilsson ◽  
Hans-Erik Nilsson

2003 ◽  
Vol 2 (2-4) ◽  
pp. 109-112 ◽  
Author(s):  
Hiroshi Nakatsuji ◽  
Yoshinari Kamakura ◽  
Kenji Taniguchi

2008 ◽  
Vol 5 (1) ◽  
pp. 43-46 ◽  
Author(s):  
K. Huet ◽  
C. Chassat ◽  
D.-P. Nguyen ◽  
S. Galdin-Retailleau ◽  
A. Bournel ◽  
...  

2000 ◽  
Vol 338-342 ◽  
pp. 765-768 ◽  
Author(s):  
H.-E. Nilsson ◽  
E. Bellotti ◽  
K.F. Brennan ◽  
M. Hjelm

VLSI Design ◽  
2001 ◽  
Vol 13 (1-4) ◽  
pp. 301-304 ◽  
Author(s):  
A. Harkar ◽  
R. W. Kelsall ◽  
J. N. Ellis

This paper presents the spatial distribution of hot electrons along the channel of a 0.35 micron MOSFET using the full band pseudopotential Monte Carlo simulator DAMOCLES. The important aspect of this investigation is the implementation of a rigorous statistical enhancement technique along the channel of the device, to probe the hot electrons generated along the channel. Simulations have been carried out for different bias points. The results clearly show that the probability of generating electrons with energies sufficient for injection into the oxide layer is significant only at the drain side of the device. It is also observed that the peak gate current occurs exactly just inside the LDD region coincident with the position of maximum lateral electric field.


2011 ◽  
Vol 40 (8) ◽  
pp. 1651-1656 ◽  
Author(s):  
Enrico Bellotti ◽  
Michele Moresco ◽  
Francesco Bertazzi

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