Reactive Ion Etching of Columnar Nanostructured ${\rm TiO}_{2}$ Thin Films for Modified Relative Humidity Sensor Response Time

2009 ◽  
Vol 9 (12) ◽  
pp. 1979-1986 ◽  
Author(s):  
Martin R. Kupsta ◽  
Michael T. Taschuk ◽  
Michael J. Brett ◽  
Jeremy C. Sit
Keyword(s):  
Thin Films ◽  
Relative Humidity ◽  
Response Time ◽  
Humidity Sensor ◽  
Reactive Ion Etching ◽  
Sensor Response ◽  
Ion Etching ◽  
Relative Humidity Sensor

Relative Humidity Sensor Based on Rough Polysilicon Thin Films

2019 ◽  
Vol 4 (1) ◽  
pp. 107-114
Author(s):  
P. Zambrozi ◽  
R. C. Teixeira ◽  
F. Fruett
Keyword(s):  
Thin Films ◽  
Relative Humidity ◽  
Humidity Sensor ◽  
Relative Humidity Sensor

Relative Humidity Sensor Based on Tilted Fiber Bragg Grating With Polyvinyl Alcohol Coating

2009 ◽  
Vol 21 (7) ◽  
pp. 441-443 ◽  
Author(s):  
Yinping Miao ◽  
Bo Liu ◽  
Hao Zhang ◽  
Yuan Li ◽  
Haibin Zhou ◽  
...  
Keyword(s):  
Relative Humidity ◽  
Polyvinyl Alcohol ◽  
Fiber Bragg Grating ◽  
Humidity Sensor ◽  
Bragg Grating ◽  
Relative Humidity Sensor

Reactive Ion Etching of Al-1%Cu alloy thin films

2009 ◽  
Author(s):  
Jun Gou ◽  
Zhi-ming Wu ◽  
Hui-ling Tai ◽  
Kai Yuan
Keyword(s):  
Thin Films ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Cu Alloy

Highly sensitive BEHP-co-MEH:PPV + Poly(acrylic acid) partial sodium salt based relative humidity sensor

2017 ◽  
Vol 246 ◽  
pp. 809-818 ◽  
Author(s):  
Memoon Sajid ◽  
Hyun Bum Kim ◽  
Young Jin Yang ◽  
Jeongdai Jo ◽  
Kyung Hyun Choi
Keyword(s):  
Relative Humidity ◽  
Acrylic Acid ◽  
Sodium Salt ◽  
Humidity Sensor ◽  
Highly Sensitive ◽  
Relative Humidity Sensor ◽  
Poly Acrylic Acid

A low cost relative humidity sensor fabricated by coating optical fused fiber coupler with sol-gel material

2008 ◽  
Author(s):  
Fufei Pang ◽  
Ping Xu ◽  
Min Wang ◽  
Xianglong Zeng ◽  
Zhenyi Chen ◽  
...  
Keyword(s):  
Relative Humidity ◽  
Humidity Sensor ◽  
Low Cost ◽  
Sol Gel ◽  
Fiber Coupler ◽  
Relative Humidity Sensor

Reactive Ion Etching Damage to Ferroelectric Thin Films Capacitors

1994 ◽  
Vol 361 ◽  
Author(s):  
W. Pan ◽  
C.L. Thio ◽  
S.B. Desu ◽  
Cheewon Chung
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Leakage Current ◽  
Reactive Ion Etching ◽  
Ferroelectric Thin Films ◽  
Electric Properties ◽  
Etching Time ◽  
Ion Etching ◽  
Before And After ◽  
Ferroelectric Capacitors

ABSTRACTReactive ion etching damage to sputtered Pt/PZT/Pt ferroelectric capacitors was studied using Ar and CHCIFCF3 etch gases. Electrical properties, hysteresis, fatigue, and leakage current of PZT capacitors, before and after etching, were compared to examine the etching damage. It is found that the damage effects depend on etching time and are mainly due to the physical bombardment effect. The PZT capacitors etched with CHCIFCF3 plasma showed less damage than those etched in Ar plasma. The electric properties of etched Pt/PZT/Pt capacitors are recovered by annealing at 400 °C for 30min.

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