An Ultra-Low-Power Fully-Static Contention-Free Flip-Flop With Complete Redundant Clock Transition and Transistor Elimination

Author(s):  
Gicheol Shin ◽  
Eunyoung Lee ◽  
Jongmin Lee ◽  
Yongmin Lee ◽  
Yoonmyung Lee
2021 ◽  
Author(s):  
Yugal Maheshwari ◽  
Kleber Stangherlin ◽  
Derek Wright ◽  
Manoj Sachdev

2019 ◽  
Vol 54 (2) ◽  
pp. 550-559 ◽  
Author(s):  
Yunpeng Cai ◽  
Anand Savanth ◽  
Pranay Prabhat ◽  
James Myers ◽  
Alex S. Weddell ◽  
...  

Author(s):  
Sagi Fisher ◽  
Adam Teman ◽  
Dmitry Vaysman ◽  
Alexander Gertsman ◽  
Orly Yadid-Pecht ◽  
...  
Keyword(s):  

2019 ◽  
Vol 18 ◽  
pp. 756-761
Author(s):  
Ahmad Karimi ◽  
Abdalhossein Rezai ◽  
Mohammad Mahdi Hajhashemkhani

2014 ◽  
Vol 61 (6) ◽  
pp. 1755-1765 ◽  
Author(s):  
Djaafar Chabi ◽  
Weisheng Zhao ◽  
Erya Deng ◽  
Yue Zhang ◽  
Nesrine Ben Romdhane ◽  
...  

Integration ◽  
2018 ◽  
Vol 60 ◽  
pp. 160-166 ◽  
Author(s):  
Ahmad Karimi ◽  
Abdalhossein Rezai ◽  
Mohammad Mahdi Hajhashemkhani

Growing demand for portable devices and fast increases in complexity of chip cause power dissipation is an important parameter. Power consumption and dissipation or generations of more heat possess a restriction in the direction of the integration of more transistors. Several methods have been proposed to reduce power dissipation from system level to device level. Subthreshold circuits are widely used in more advanced applications due to ultra low-power consumption. The present work targets on construction of linear feedback shift registers (LFSR) in weak inversion region and their performance observed in terms of parameters like power delay product (PDP). In CMOS circuits subthreshold region of operation allows a low-power for ample utilizations but this advantage get with the penalty of flat speed. For the entrenched and high speed applications, improving the speed of subthreshold designs is essential. To enhance this, operate the devices at maximum current over capacitance. LFSR architectures build with various types of D flip flop and XOR gate circuits are analyzed. Circuit level Simulation is carried out using 130 nm technologies.


Author(s):  
Yuzuru SHIZUKU ◽  
Tetsuya HIROSE ◽  
Nobutaka KUROKI ◽  
Masahiro NUMA ◽  
Mitsuji OKADA

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