Influence of Guard-Ring Structure on the Dark Count Rates of Silicon Photomultipliers

2013 ◽  
Vol 34 (3) ◽  
pp. 336-338 ◽  
Author(s):  
Woo-Suk Sul ◽  
Chae-Hun Lee ◽  
Gyu-Seong Cho
1989 ◽  
Vol 25 (4) ◽  
pp. 296
Author(s):  
J.K. Twynam ◽  
P.A. Claxton ◽  
R.C. Woods ◽  
D.R. Wight
Keyword(s):  

2019 ◽  
Vol 33 (09) ◽  
pp. 1950099
Author(s):  
Wei Wang ◽  
Guang Wang ◽  
Hongan Zeng ◽  
Yuanyao Zhao ◽  
U-Fat Chio ◽  
...  

A single photon avalanche diode (SPAD) structure designed with standard 180 nm CMOS technology is investigated in detail. The SPAD employs a [Formula: see text]-well anode, rather than the conventional [Formula: see text] layer, and with a [Formula: see text]-well/deep [Formula: see text]-well junction with square shape, a deep retrograde [Formula: see text]-well virtual guard ring which prevents the premature edge avalanche breakdown. The analytical and simulation results show that the SPAD exhibits a uniform electric field distribution in [Formula: see text]-well/deep [Formula: see text]-well junction with the active area of [Formula: see text], and the avalanche breakdown voltage is as low as 9 V, the peak of the photon detection efficiency (PDE) is about 33% at 500 nm, the relatively low dark count rate (DCR) of 0.66 KHz at room temperature is obtained.


2003 ◽  
Vol 50 (2) ◽  
pp. 537-540
Author(s):  
Dejun Han ◽  
Chuanmin Wang ◽  
Guangfu Wang ◽  
Shuchen Du ◽  
Liyan Shen ◽  
...  

Author(s):  
Hsieh-Shen Hsieh ◽  
Heng-Chung Chang ◽  
Chih-Fan Hu ◽  
Chao-Lin Cheng ◽  
Weileun Fang
Keyword(s):  

2010 ◽  
Vol 31 (1) ◽  
pp. 41-43 ◽  
Author(s):  
Woo-Suk Sul ◽  
Jung-Hun Oh ◽  
Chae-Hun Lee ◽  
Gyu-Seong Cho ◽  
Wan-Gyu Lee ◽  
...  

1992 ◽  
Vol 70 (10-11) ◽  
pp. 1070-1075
Author(s):  
D. Scansen ◽  
S. O. Kasap

Measurements have been carried out on a p+ n type Ge avalanche photodiode (typical guard ring structure with channel stoppers) to obtain the excess noise factor, F; multiplication, M; and the dark current, Id over a wide range of temperatures (143–323 K). The multiplication initially increases with the illumination wavelength and peaks in the 1550 nm region because of more holes being injected into the avalanche region as the absorption depth becomes much longer than the width of the p+ region. The excess noise factor, F, at À = 1550 nm was typically slightly less than multiplication, M, and showed very little dependence on temperature. The effective ratio of electron to hole ionization coefficients was approximately 0.7–0.8, the dark current activation energy close to room temperature was about Eg, indicating that the dark current is controlled by the diffusion of minority carriers. Below ~ 232 K, dark current activation energy is about Eg/2, indicative of carrier generation in the depletion region. M varied approximately as T−n, with n depending strongly on the reverse bias. In the low-frequency range below ~ 200 Hz, the noise current followed a 1/f behavior.


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