Development of low voltage field emitter cathodes with enhanced electron emission coatings for flat panel displays

Author(s):  
D. Palmer ◽  
D. Temple ◽  
J. Mancusi ◽  
L. Yadon ◽  
D. Vellenga ◽  
...  
1996 ◽  
Author(s):  
Aldo Badano ◽  
Michael J. Flynn ◽  
Ehsan Samei ◽  
Kimberlee G. Kearfott

Electronics ◽  
2021 ◽  
Vol 10 (18) ◽  
pp. 2309
Author(s):  
Hyoung-Rae Kim ◽  
Chang-Ho An ◽  
Bai-Sun Kong

A high-speed column driver IC with an area-efficient high-slew-rate buffer amplifier is proposed for use in a large-sized, high-resolution TFT-LCD panel application. In the proposed architecture, explicit isolation switches have been embedded into the buffer amplifier resulting in a fast settling response. The amplifier also has a structure that adjusts the tail current of the input stage using a very compact adaptive biasing. The proposed column driver IC, having the proposed buffer amplifier for driving a 55-inch 4K ultra-high-definition (UHD) TV panel, was fabricated in a 0.18-μm 1.8-V low-voltage, 1.2-μm 9-V medium-voltage, and 1.6-μm 18-V high-voltage CMOS process. The performance evaluation results indicated that 90% and 99.9% falling settling times were improved from 1.947 µs to 0.710 µs (63.5% improvement) and 4.131 µs to 2.406 µs (41.7% improvement), respectively. They also indicated that the layout size of the proposed buffer amplifier was reduced from 5580 μm2 to 4402 μm2 (21.1% reduction).


Author(s):  
Cyril Hilsum

This paper describes the history and science behind the development of modern flat-panel displays, and assesses future trends. Electronic displays are an important feature of modern life. For many years the cathode ray tube, an engineering marvel, was universal, but its shape was cumbersome and its operating voltage too high. The need for a flat-panel display, working at a low voltage, became imperative, and much research has been applied to this need. Any versatile flat-panel display will exploit an electro-optical effect, a transparent conductor and an addressing system to deliver data locally. The first need is to convert an electrical signal into a visible change. Two methods are available, the first giving emission of light, the second modulating ambient illumination. The most useful light-emitting media are semiconductors, historically exploiting III–V or II–VI compounds, but more recently organic or polymer semiconductors. Another possible effect uses gas plasma discharges. The modulating, or subtractive, effects that have been studied include liquid crystals, electrophoresis, electrowetting and electrochromism. A transparent conductor makes it possible to apply a voltage to an extended area while observing the results. The design is a compromise, since the free electrons that carry current also absorb light. The first materials used were metals, but some semiconductors, when heavily doped, give a better balance, with high transmission for a low resistance. Delivering data unambiguously to a million or so picture elements across the display area is no easy task. The preferred solution is an amorphous silicon thin-film transistor deposited at each cross-point in an X – Y matrix. Success in these endeavours has led to many applications for flat-panel displays, including television, flexible displays, electronic paper, electronic books and advertising signs.


2001 ◽  
Vol 78 (22) ◽  
pp. 3418-3420 ◽  
Author(s):  
H. Busta ◽  
D. Furst ◽  
A. T. Rakhimov ◽  
V. A. Samorodov ◽  
B. V. Seleznev ◽  
...  

Author(s):  
E. F. Lindsey ◽  
C. W. Price ◽  
E. L. Pierce ◽  
E. J. Hsieh

Columnar structures produced by DC magnetron sputtering can be altered by using RF biased sputtering or by exposing the film to nitrogen pulses during sputtering, and these techniques are being evaluated to refine the grain structure in sputtered beryllium films deposited on fused silica substrates. Beryllium is brittle, and fractures in sputtered beryllium films tend to be intergranular; therefore, a convenient technique to analyze grain structure in these films is to fracture the coated specimens and examine them in an SEM. However, fine structure in sputtered deposits is difficult to image in an SEM, and both the low density and the low secondary electron emission coefficient of beryllium seriously compound this problem. Secondary electron emission can be improved by coating beryllium with Au or Au-Pd, and coating also was required to overcome severe charging of the fused silica substrate even at low voltage. The coating structure can obliterate much of the fine structure in beryllium films, but reasonable results were obtained by using the high-resolution capability of an Hitachi S-800 SEM and either ion-beam coating with Au-Pd or carbon coating by thermal evaporation.


2012 ◽  
Author(s):  
Michael Sackllah ◽  
Denny Yu ◽  
Charles Woolley ◽  
Steven Kasten ◽  
Thomas J. Armstrong

Sign in / Sign up

Export Citation Format

Share Document