Selective and deep etching of SiO/sub 2/ in high density low pressure fluorocarbon plasmas
2020 ◽
Keyword(s):
2020 ◽
Vol 76
(3)
◽
pp. 424-441
Keyword(s):
Keyword(s):
2000 ◽
Vol 18
(5)
◽
pp. 2224
◽
Keyword(s):
1999 ◽
Vol 17
(3)
◽
pp. 741-748
◽