Measurements of Air Breakdown and Scaling to Microwaves Using 193 nm Focused Laser Radiation

Author(s):  
John Scharer ◽  
Magesh Thiyagarajan ◽  
C. Mark Denning ◽  
Siqi Luo
Keyword(s):  
2018 ◽  
Vol 209 ◽  
pp. 00010
Author(s):  
Vitaly Kobtsev ◽  
Sergey Kostritsa ◽  
Dmitrii Kozlov ◽  
Alexey Pelevkin ◽  
Valery Smirnov ◽  
...  

The research is devoted to gas mixtures ignition by UV laser radiation. The dissociation of O2 molecules by a pulse of excimer ArF laser radiation at 193-nm wavelength with formation of the chemically active oxygen atoms initiating chain reactions which cause ignition of H2/O2 mixture was employed. The experimental test bench was created with CARS and fluorescent techniques for experimental investigation of some peculiarities of mixture ignition and combustion caused by such photo-dissociation, at conditions typical for combustion chamber. Two-dimensional numerical modeling of combustion process in model combustion chamber, based on kinetic mechanism of H2 oxidation including atom O(1P) and radicals OH(A2Σ+), was performed.


1993 ◽  
Author(s):  
Peter R. Herman ◽  
Boyi Chen ◽  
J. David Moore
Keyword(s):  

1999 ◽  
Author(s):  
Joerg Heber ◽  
Roland Thielsch ◽  
Holger Blaschke ◽  
Norbert Kaiser ◽  
Uwe Leinhos ◽  
...  

1999 ◽  
Vol 138-139 ◽  
pp. 93-96 ◽  
Author(s):  
P Laurens ◽  
B Sadras ◽  
F Decobert ◽  
F Arefi ◽  
J Amouroux

1995 ◽  
Vol 60 (3) ◽  
pp. 261-270 ◽  
Author(s):  
A. Costela ◽  
J. M. Figuera ◽  
F. Florido ◽  
I. Garc�a-Moreno ◽  
E. P. Collar ◽  
...  

1982 ◽  
Vol 17 ◽  
Author(s):  
T. F. Deutsch ◽  
D. J. Silversmith ◽  
R. W. Mountain

ABSTRACTSi3N4 films have been deposited on Si by using 193 nm ArF excimer laser radiation to initiate the reaction of SiH4 and NH3 at substrate temperatures between 200–600°C. Stoichiometric films having physical and optical properties comparable to those produced using low-pressure chemical vapor deposition (LPCVD) have been produced. The dielectric properties of the films are at present inferior to those of LPCVD material.


Sign in / Sign up

Export Citation Format

Share Document