ABSTRACTAmorphous silicon films and solar cell i-layers were prepared from dichlorosilane(DCS) by ECR- and VHF-CVD. The hydrogen content, the chlorine content and the band gap could be controlled by varying argon and hydrogen dilution. The interaction of energetic and reactive plasma species with substrates and other previously deposited layers was studied. DCS, ECR-CVD causes darkening of TCO substrates even when buffer layers and/or doped layers were previously deposited by RF-CVD. Therefore n-i-p solar cell structures were prepared on NiCr and subsequent p-i-n solar cells were prepared with VHF-CVD which did not causeTCO reduction or other reactions in previously deposited amorphous layers. Preliminary results indicate that the VHF-CVD solar cells are at least as stable as standard amorphous silicon solar cells.
Light-induced degradation in different p-i-n and n-i Schottky barrier solar cell structures
