High-density hollow cathode plasma etching for large area multicrystalline silicon solar cells

2003 ◽  
Author(s):  
W.J. Lee ◽  
J.H. Lee ◽  
U. Gangopadhyay ◽  
I.O. Parm ◽  
K. Chakrabarty ◽  
...  
Keyword(s):  
Solar Cells ◽  
Plasma Etching ◽  
Hollow Cathode ◽  
High Density ◽  
Multicrystalline Silicon ◽  
Silicon Solar Cells ◽  
Large Area ◽  
Cathode Plasma

Texturisation of multicrystalline silicon solar cells by RIE and plasma etching

2003 ◽  
Vol 80 (2) ◽  
pp. 227-237 ◽  
Author(s):  
W.A. Nositschka ◽  
O. Voigt ◽  
P. Manshanden ◽  
H. Kurz
Keyword(s):  
Solar Cells ◽  
Plasma Etching ◽  
Multicrystalline Silicon ◽  
Silicon Solar Cells

Surface and bulk-passivated large area multicrystalline silicon solar cells

1997 ◽  
Vol 48 (1-4) ◽  
pp. 219-228 ◽  
Author(s):  
K. Fukui ◽  
K. Okada ◽  
Y. Inomata ◽  
H. Takahashi ◽  
S. Fujii ◽  
...  
Keyword(s):  
Solar Cells ◽  
Multicrystalline Silicon ◽  
Silicon Solar Cells ◽  
Large Area

Production technology of large-area multicrystalline silicon solar cells

2001 ◽  
Vol 65 (1-4) ◽  
pp. 269-275 ◽  
Author(s):  
Shuich Fujii ◽  
Yuko Fukawa ◽  
Hiroaki Takahashi ◽  
Yosuke Inomata ◽  
Kenichi Okada ◽  
...  
Keyword(s):  
Solar Cells ◽  
Production Technology ◽  
Multicrystalline Silicon ◽  
Silicon Solar Cells ◽  
Large Area

High density large area hydrogen plasma by hollow cathode plasma array

2010 ◽  
Vol 205 (5) ◽  
pp. 1532-1535 ◽  
Author(s):  
Jeonghee Cho ◽  
Jack Yang ◽  
Haejung Park ◽  
Se-Geun Park
Keyword(s):  
Hollow Cathode ◽  
Hydrogen Plasma ◽  
High Density ◽  
Large Area ◽  
Cathode Plasma

scholarly journals Effectively Improved SiO2-TiO2Composite Films Applied in Commercial Multicrystalline Silicon Solar Cells

2013 ◽  
Vol 2013 ◽  
pp. 1-8 ◽  
Author(s):  
Chih-Hsiang Yang ◽  
Shui-Yang Lien ◽  
Chia-Ho Chu ◽  
Chung-Yuan Kung ◽  
Tieh-Fei Cheng ◽  
...  
Keyword(s):  
Solar Cells ◽  
Low Cost ◽  
Incident Light ◽  
Sol Gel ◽  
Surface Recombination ◽  
Chemical Vapor ◽  
Multicrystalline Silicon ◽  
Silicon Solar Cells ◽  
Antireflective Coatings ◽  
Large Area

Composite silicon dioxide-titanium dioxide (SiO2-TiO2) films are deposited on a large area of 15.6 × 15.6 cm2textured multicrystalline silicon solar cells to increase the incident light trapped within the device. For further improvement of the antireflective coatings (ARCs) quality, dimethylformamide (DMF) solution is added to the original SiO2-TiO2solutions. DMF solution solves the cracking problem, thus effectively decreasing reflectance as well as surface recombination. The ARCs prepared by sol-gel process and plasma-enhanced chemical vapor deposition (PECVD) on multicrystalline silicon substrate are compared. The average efficiency of the devices with improved sol-gel ARCs is 16.3%, only 0.5% lower than that of devices with PECVD ARCs (16.8%). However, from equipment depreciation point of view (the expiration date of equipment is generally considered as 5 years), the running cost (USD/watt) of sol-gel technique is 80% lower than that of PECVD method for the first five years and 66% lower than that of PECVD method from the start of the sixth year. This result proves that sol-gel-deposited ARCs process has potential applications in manufacturing low-cost, large-area solar cells.

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