Overview of atomic layer deposited metal oxides for treating nanoporous TiO2 photoelectrode for dye sensitized solar cells

Author(s):  
Mariyappan Shanmugam ◽  
Braden Bills ◽  
Mahdi Farrokh Baroughi
2009 ◽  
Vol 92 (2) ◽  
pp. 289-301 ◽  
Author(s):  
Rajan Jose ◽  
Velmurugan Thavasi ◽  
Seeram Ramakrishna

2010 ◽  
Vol 1270 ◽  
Author(s):  
Braden Bills ◽  
Mariyappan Shanmugam ◽  
Mahdi Farrokh Baroughi ◽  
David Galipeau

AbstractThe performance of dye-sensitized solar cells (DSSCs) is limited by the back-reaction of photogenerated electrons from the porous titanium oxide (TiO2) nanoparticles back into the electrolyte solution, which occurs almost exclusively through the interface. This and the fact that DSSCs have a very large interfacial area makes their performance greatly dependant on the density and activity of TiO2 surface states. Thus, effectively engineering the TiO2/dye/electrolyte interface to reduce carrier losses is critically important for improving the photovoltaic performance of the solar cell. Atomic layer deposition (ALD), which uses high purity gas precursors that can rapidly diffuse through the porous network, was used to grow a conformal and controllable aluminum oxide (Al2O3) and hafnium oxide (HfO2) ultra thin layer on the TiO2 surface. The effects of this interfacial treatment on the DSSC performance was studied with dark and illuminated current-voltage and electrochemical impedance spectroscopy (EIS) measurements.


2012 ◽  
Vol 520 (6) ◽  
pp. 1745-1750 ◽  
Author(s):  
Ta-Chang Tien ◽  
Fu-Ming Pan ◽  
Lih-Ping Wang ◽  
Feng-Yu Tsai ◽  
Ching Lin

Sign in / Sign up

Export Citation Format

Share Document