Development of p-type amorphous silicon oxide — Nano crystalline silicon double layer and its application in n-i-p type amorphous silicon solar cell

Author(s):  
Sangho Kim ◽  
S. M. Iftiquar ◽  
Jinjoo Park ◽  
Duy Phong Pham ◽  
Chonghoon Shin ◽  
...  
2007 ◽  
Vol 989 ◽  
Author(s):  
Porponth Sichanugrist ◽  
Nirut Pingate ◽  
Channarong Piromjit

AbstractMicrocrystalline silicon oxide (μc-SiO) deposited from the gas mixture of silane and carbondioxide using VHF plasma was reported by authors to be the promising material for thin-film silicon solar cell fabricated on glass substrate, comparing with the conventional amorphous silicon oxide or microcrystalline silicon p-layer. High-performance, tandem-type solar cell with amorphous and microcrystalline cells (double cells) has been achieved by ap-plying this μc-SiO to the p-layer of both cells.Further work has been extended to a-Si tandem type solar cell with triple cell configu-ration using amorphous silicon oxide (a-SiO), amorphous silicon germanium (a-SiGe) and microcrystalline Si (μc-Si) as the top, middle and bottom cells, respectively. Up to now, cell efficiency of 15.7 % has been achieved using this novel μc-SiO.


2015 ◽  
Vol 132 ◽  
pp. 348-355 ◽  
Author(s):  
S.M. Iftiquar ◽  
Juyeon Jung ◽  
Chonghoon Shin ◽  
Hyeongsik Park ◽  
Jinjoo Park ◽  
...  

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