Effects of Air pressure and substrate bias on magnetic properties and microstructure in amorphous TbCo sputtered films

1985 ◽  
Vol 21 (5) ◽  
pp. 1635-1637 ◽  
Author(s):  
M. Ohkoshi ◽  
M. Harada ◽  
T. Tokunaga ◽  
S. Honda ◽  
T. Kusuda
Keyword(s):  
Magnetic Properties ◽  
Air Pressure ◽  
Substrate Bias ◽  
Sputtered Films

Substrate bias effects on film composition and magnetic properties in amorphous GdCo sputtered films

1981 ◽  
Vol 64 (11) ◽  
pp. 94-102
Author(s):  
Masatoshi Ohkoshi ◽  
Kohji Inoue ◽  
Shigeo Honda ◽  
Tetsuzo Kusuda
Keyword(s):  
Magnetic Properties ◽  
Substrate Bias ◽  
Film Composition ◽  
Sputtered Films

Effects of Microstructure and Crystallography on the Magnetic Properties of CoCrPt/Cr Thin Films

1994 ◽  
Vol 343 ◽  
Author(s):  
G. Choe ◽  
S.J. Chung
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Exchange Coupling ◽  
Grain Morphology ◽  
Substrate Bias ◽  
Cross Sectional ◽  
Sputtered Films ◽  
Argon Sputtering ◽  
Sputtering Pressure ◽  
The Magnetic Field

ABSTRACTThe effects of grain morphology and crystallography on the magnetic properties of CoCrPt/Cr thin films were investigated as a function of sputtering parameters of CoCrPt thin films. Cross sectional TEM exhibited strong separation of Co grains with increasing argon sputtering pressure, resulting in reduced exchange coupling and increased coercivity. Most Co grains sputtered at high pressure were separated by 10 to 20 Å thick boundaries, possibly due to the enhanced scattering of argon ions by sputtering particles and thus the observed higher content of Pt in the deposited films. The application of substrate bias greatly decreased the Co grain separation and the nonmagnetic grain boundary disappeared by -200 V bias sputtering, resulting in increased exchange coupling. The bias sputtered CoCrPt thin films decreased their grain size and increased epitaxial growth on Cr layer and also (1010) texture. The magnetic field required to saturate the film increased significantly with increasing substrate bias, possibly due to the induced residual stress in the bias sputtered films.

Magnetic properties of Fe-Cu and Fe-Ag sputtered films

1990 ◽  
Author(s):  
K.I. Arai ◽  
Y. Hayashi ◽  
M. Yamaguchi
Keyword(s):  
Magnetic Properties ◽  
Sputtered Films

Substrate Bias Effect on the Oxygen Contamination in Amorphous GdCo Sputtered Films

1980 ◽  
Vol 19 (9) ◽  
pp. 1807-1808 ◽  
Author(s):  
Masatoshi Ohkoshi ◽  
Ryoji Ohkata ◽  
Koji Inoue ◽  
Shigeo Honda ◽  
Tetsuzo Kusuda
Keyword(s):  
Substrate Bias ◽  
Bias Effect ◽  
Sputtered Films ◽  
Oxygen Contamination

scholarly journals The Effects of Ph Addition on Crystal Structure and Magnetic Properties of Ba-Ferrite Sputtered Films

1994 ◽  
Vol 18 (S_1_PMRC_94_1) ◽  
pp. S1_69-72 ◽  
Author(s):  
Akimitsu MORISAKO ◽  
Mitsunori MATSUMOTO ◽  
Masahiko NAOE
Keyword(s):  
Crystal Structure ◽  
Magnetic Properties ◽  
Sputtered Films ◽  
Effects Of Ph

Crystallography and magnetic properties of CoCrTa films prepared on Cr underlayers with different substrate bias conditions

1991 ◽  
Vol 69 (8) ◽  
pp. 5163-5165 ◽  
Author(s):  
Jason Pressesky ◽  
Sang Y. Lee ◽  
Shanlin Duan ◽  
Deborah Williams
Keyword(s):  
Magnetic Properties ◽  
Substrate Bias

Magnetic Properties of Fe-Si-Al Sputtered Films

1987 ◽  
Vol 2 (10) ◽  
pp. 905-911 ◽  
Author(s):  
M. Takahashi ◽  
S. Suwabe ◽  
T. Narita ◽  
T. Wakiyama
Keyword(s):  
Magnetic Properties ◽  
Sputtered Films
Sign in / Sign up

Export Citation Format

Share Document