Low-Pressure Chemical Vapor Deposition of alpha-Si3N4 from SiF4 and NH3: Nucleation and Growth Characteristics
1992 ◽
Vol 75
(10)
◽
pp. 2803-2808
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1992 ◽
Vol 10
(4)
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pp. 869-873
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2002 ◽
Vol 12
(4)
◽
pp. 69-74
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Keyword(s):
Keyword(s):
2017 ◽
Vol 19
(8)
◽
pp. 1700193
◽
Keyword(s):
Keyword(s):